Quantitative high resolution transmission electron microscopy studies of intentionally grown 1InN/nGaN short-period superlattices (SLs) were performed. The structures were found to consist of an InxGa1−xN monolayer with an Indium content of x = 0.33 instead of the intended x = 1. Self-consistent calculations of the band structures of 1In0.33Ga0.67N/nGaN SLs were carried out, including a semi-empirical correction for the band gaps. The calculated band gap, Eg, as well as its pressure derivative, dEg/dp, are in very good agreement with the measured photoluminescence energy, EPL, and its pressure derivative, dEPL/dp, for a series of 1In0.33Ga0.67N/nGaN samples with n ranging from 2 to 40. This resolves a discrepancy found earlier between measured and calculated optical emission properties, as those calculations were made with the assumption of a 1InN/nGaN SL composition.
The electronic structures of short period mGaN/nGayAl1−yN and mInyGa1-yN/nGaN superlattices grown along the wurtzite c axis have been calculated for different alloy compositions y and various small numbers m of well- and n of barrier-monolayers. The general trends in gap behavior can, to a large extent, be related to the strength of the internal electric field, E, in the GaN and InGaN quantum wells. In the GaN/GaAlN superlattices, E reaches 4 MV/cm, while in the InGaN/GaN superlattices, values as high as E ≈ 6.5 MV/cm are found. The strong electric fields are caused by spontaneous and piezoelectric polarizations, the latter contribution dominating in InGaN/GaN superlattices. The influence of different arrangements of In atoms (indium clustering) on the band gap values in InGaN/GaN superlattices is examined.
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