The properties of the plasma of a n underexpanded jet in air were examined by optical and by probe methods as described in a previous paper (Contrib. Plasma Phys. 27 (1987) 203). The jet was produced by an erosion plusmatron with xenon-filling operating in a single-pulse regime. Now, independent measurements of the space-time development of the electron density by microwave interferometry are described. The results of cut-off and phase shift measurements are in agreement with those obtained by probe diagnostics.
Etching of silicon has been examined in CBrF3 plasma in a wide pressure range . Optical emission of CBrF3 plasma was investigated in the visible range.Mass spectrometry was used for the studying of ion plasma composition and for the determination of the main etching products. Conditions for the high quality trenches were determined.
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