Harnessing the spin–momentum locking of topological surface states in conjunction with magnetic materials is the first step to realize novel topological insulator-based devices. Here, we report strong interfacial coupling in Bi2Se3/yttrium iron garnet (YIG) bilayers manifested as large interfacial in-plane magnetic anisotropy (IMA) and enhancement of damping probed by ferromagnetic resonance. The interfacial IMA and damping enhancement reaches a maximum when the Bi2Se3 film approaches its two-dimensional limit, indicating that topological surface states play an important role in the magnetization dynamics of YIG. Temperature-dependent ferromagnetic resonance of Bi2Se3/YIG reveals signatures of the magnetic proximity effect of TC as high as 180 K, an emerging low-temperature perpendicular magnetic anisotropy competing the high-temperature IMA, and an increasing exchange effective field of YIG steadily increasing toward low temperature. Our study sheds light on the effects of topological insulators on magnetization dynamics, essential for the development of topological insulator-based spintronic devices.

The integration of quantum materials like topological insulators (TIs) with magnetic insulators (MIs) has important technological implications for spintronics and quantum computing. Here, we report excellent crystallinity of c-axis oriented epitaxial TI films of Bi2Se3 grown on MI films, a rare earth iron garnet (ReIG), such as thulium iron garnet (Tm3Fe5O12, TmIG), by molecular beam epitaxy using Se-buffered low-temperature growth technique. Strained-TmIG films with robust perpendicular magnetic anisotropy were deposited by off-axis sputtering. We demonstrated a streaky reflection high-energy electron diffraction pattern starting from the very first quintuple layer of Bi2Se3, indicating the high-quality interface between TmIG and Bi2Se3, a prerequisite for studying interfacial exchange coupling effects. The strong interfacial exchange interaction was manifested by the observation of an anomalous Hall effect in the Bi2Se3/TmIG bilayer and a shift of the ferromagnetic resonance field of TmIG induced by Bi2Se3. We have reproducibly grown high-quality Bi2Se3/ReIG and interfaces using this TI growth method, which may be applied to grow other types of van der Waals hetero-structures.

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To preserve the high quality topological surface state after air exposure without degradation, it is crucial to identify an effective capping layer. In this study, we report an effective capping layer obtained by crystallizing Se. Upon extended exposure to ultrahigh vacuum or humid air, we show by using x-ray photoemission spectroscopy that the stability and resistance to oxidation of crystalline Se capping layers are superior to those of the amorphous Se capping layer, which has been commonly used by current communities. Furthermore, time-dependent Hall measurements showed that crystalline Se capping layers had a much stronger ability to sustain the intrinsic transport properties of Bi2Se3.

The spintronics applications long anticipated for topological insulators (TIs) has been hampered due to the presence of high density intrinsic defects in the bulk states. In this work we demonstrate the back-gating effect on TIs by integrating Bi2Se3 films 6–10 quintuple layer (QL) thick with amorphous high-κ oxides of Al2O3 and Y2O3. Large gating effect of tuning the Fermi level EF to very close to the band gap was observed, with an applied bias of an order of magnitude smaller than those of the SiO2 back gate, and the modulation of film resistance can reach as high as 1200%. The dependence of the gating effect on the TI film thickness was investigated, and ΔN2D/ΔVg varies with TI film thickness as ∼t−0.75. To enhance the gating effect, a Y2O3 layer thickness 4 nm was inserted into Al2O3 gate stack to increase the total κ value to 13.2. A 1.4 times stronger gating effect is observed, and the increment of induced carrier numbers is in good agreement with additional charges accumulated in the higher κ oxides. Moreover, we have reduced the intrinsic carrier concentration in the TI film by doping Te to Bi2Se3 to form Bi2TexSe1−x. The observation of a mixed state of ambipolar field that both electrons and holes are present indicates that we have tuned the EF very close to the Dirac Point. These results have demonstrated that our capability of gating TIs with high-κ back gate to pave the way to spin devices of tunable EF for dissipationless spintronics based on well-established semiconductor technology.