Generally, ZnS–SiO2 thin film is used as a protective layer in phase-change optical media. The wet etching characteristics of ZnS–SiO2 have been investigated, and it was found that ZnS–SiO2 can be patterned by laser irradiation and wet etching. Convex patterns of ZnS–SiO2 with steep taper profiles were formed. The minimum size of ZnS–SiO2 dots was 90 nm, and the minimum width of ZnS–SiO2 lines was 100 nm. These pattern sizes were approximately one-fourth of the laser beam spot from a 405 nm laser diode (LD) with an objective lens of 0.85 numerical aperture (NA). The pattern edges of ZnS–SiO2 dots and lines were clear and smooth. These results prove that ZnS–SiO2 is a useful material for forming nanometer-scale patterns.
We show a patterning method for ZnS-SiO 2 , which has sufficient performance for fabricating nanometer-scale patterns. Convex patterns with steep taper profiles were fabricated. Minimum pattern sizes were about one-fourth of a laser beam diameter.
Simulation of near-field assisted recording using the finite-difference time-domain (FDTD) method and thermal analysis was carried out. Improvement of optical coupling efficiency between nano-patterned medium and optical near-field probe is the most important issue to design and optimize heat assisted near-field magnetic recording system. We propose the new nano-patterned medium structure that constructs the multi layer structure of silver and magnetic recording material. Local plasmon enhancement of silver layer is effective in order to improve optical near-field coupling efficiency of nano-patterned medium. The generated heat at silver layer conducts into magnetic recording material layer.
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