The goal of this paper is to explore the use of inclined exposure technology to fabricate millimeter-grade thick film polymer optical microstructures on glass substrates and to resolve the partial reflection of optical energy at interfaces that causes the structural problem of unnecessary photo cross-linking, which can affect the structural shape. This paper uses inclined exposure technology to cause UV illumination to impinge on the substrate at a certain non-perpendicular angle and fabricate a three-dimensional optical-grade micro-mirror as part of an effort to develop an integrated, miniature Blu-ray optical pickup head. Although a transparent glass substrate was employed in the experiment, the system included mask glass (n m = 1.53), glass substrate (n g = 1.5) and photopolymerized polymer (n p = 1.67). UV light tends to undergo partial reflection at the interfaces due to the materials' different refractive indices. This optical phenomenon is particularly severe at higher exposure energies (∼14 000 mJ cm −2 ) in the fabrication of millimeter-grade thick films. The Fresnel equations are used to calculate that the maximum interface reflection of optical energy is approximately 1.5%. This paper therefore selects a medium with a matching refractive index (n gl = 1.473) and removable anti-reflection technology in order to resolve the interface reflection problem, and applies this solution to 45 • micro-mirror manufacturing technology, enabling a surface roughness of approximately 20 nm (λ/20, λ = 405 nm) as measured by WYKO.
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