Amorphous nickel phosphide films were prepared by an RF glow discharge sputtering technique. The amorphous nickel phosphide films with various compositions were easily prepared by changing the sputtering atmosphere and below 25 atom%P phosphorus donated electrons to nickel but above 25 atom%P phosphorus accepted electrons from nickel.
The thin film of nickel alloys was prepared using a RF glow discharge sputtering system that was discharged between the inside and the outside electrodes of a reaction cell. It was determined by X-ray diffraction pattern that the nickel films prepared by the discharge under B2H6 atmosphere became an amorphous state.
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