An important trend in electronics involves the development of materials, mechanical designs and manufacturing strategies that enable the use of unconventional substrates, such as polymer films, metal foils, paper sheets or rubber slabs. The last possibility is particularly challenging because the systems must accommodate not only bending but also stretching. Although several approaches are available for the electronics, a persistent difficulty is in power supplies that have similar mechanical properties, to allow their co-integration with the electronics. Here we introduce a set of materials and design concepts for a rechargeable lithium ion battery technology that exploits thin, low modulus silicone elastomers as substrates, with a segmented design in the active materials, and unusual 'self-similar' interconnect structures between them. The result enables reversible levels of stretchability up to 300%, while maintaining capacity densities of B1.1 mAh cm À 2 . Stretchable wireless power transmission systems provide the means to charge these types of batteries, without direct physical contact.

Lithographically defined electrical interconnects with thin, filamentary serpentine layouts have been widely explored for use in stretchable electronics supported by elastomeric substrates. We present a systematic and thorough study of buckling physics in such stretchable serpentine microstructures, and a strategic design of serpentine layout for ultra-stretchable electrode, via analytical models, finite element method (FEM) computations, and quantitative experiments. Both the onset of buckling and the postbuckling behaviors are examined, to determine scaling laws for the critical buckling strain and the limits of elastic behavior. Two buckling modes, namely the symmetric and anti-symmetric modes, are identified and analyzed, with experimental images and numerical results that show remarkable levels of agreement for the associated postbuckling processes. Based on these studies and an optimization in design layout, we demonstrate routes for application of serpentine interconnects in an ultra-stretchable electrode that offer, simultaneously, an areal coverage as high as 81%, and a biaxial stretchability as large as ~170%.

Blinding disorders of the outer retina involve dysfunction and degeneration of photoreceptors. One potential approach to treat these forms of blindness is to repopulate the outer retina via a simple bolus injection of donor photoreceptors. However, this may not be ideal due to the highly polarized organization of photoreceptors that include apical light sensing photopigments and basal axon terminals. Furthermore, bolus injections create uncertainty with regard to the area, density, and retention of donor cells. Here, a novel and robust microfabrication process is developed to create 3D, micrometer-sized complex structures in ultrathin and biocompatible elastomer films (nonbiodegradable polydimethylsiloxane and biodegradable poly(glycerol-sebacate)) that can serve as polarizable photoreceptor delivery scaffolds, consisting of an array of cup-shaped photoreceptor capture wells that funnel into a microchannel. This "wine glass" scaffold design promotes efficient capture of human pluripotent stem-cell-derived photoreceptor cell bodies and guidance of basal axon extensions, ultimately achieving a uniform level of organization and polarization that is not possible with bolus injections or previously described scaffolds. In addition to future therapeutic applications, our scaffold design and materials provide a platform to generate reproducible and scalable in vitro models of photoreceptor-based diseases.

Photolithography based on optical mask is widely used in academic research laboratories due to its low cost, simple mechanism, and ability to pattern in micron-sized features on a wafer-scale area. Because the resolution is bound by diffraction limits of the light source, nanoscale patterning using photolithography requires short-wavelength light source combined with sophisticated optical elements, adding complexity and cost. In this paper, a novel method of subwavelength patterning process using conventional i-line mercury lamp is introduced, without the use of such advanced optical tools. The method utilizes the re-entrant geometry of image reversal photoresist produced from the developing process, where a secondary mask is generated by isotropically depositing a metal layer to cover the re-entrant profile of the photoresist. Removing the photoresist by applying ultrasonic vibrations in acetone bath uniformly cracks the metal layer at the sidewalls of the re-entrant profile, exposing the substrate with a reduced feature size. The width of the initial mask pattern can be reduced by 400 nm in a controlled manner, regardless of the original width choice. As a result, the method is shown to achieve sub-100 nm scale linear patterns compatible for both subsequent deposition process and dry-etching process. Our approach is applicable to various shapes of the patterns and can be used in electronic device fabrication requiring nanoscale lithography patterning, such as the gate fabrication of AlGaN/GaN high-electron-mobility transistor.