Photonic crystal (PC) nanocavities based on silicon nitride membranes are studied as tools for the manipulation of spontaneous emission in the wavelength range between 550 nm and 800 nm. We observe a strong modification of the fluorescence spectrum of dye molecules spin-cast on top of the PC, indicating an efficient coupling of the dye emission to the cavity modes. The cavity design is optimized with respect to the quality factor and values of nearly 1500 are achieved experimentally. Taking into account the small mode volume, which leads to a strong Purcell enhancement, these nanocavities enable the realization of efficient single photon sources in the visible region of the spectrum. Furthermore, their fabrication is fully compatible with existing CMOS technology, making an integration into more complex optoelectronic devices feasible.
A case study of use of negative type SU-8 X-ray sensitive resist for fabrication of advanced, highly precise, ultra tall direct LIGA mechanical microparts is presented in this paper. Using direct LIGA technique, $1 mm tall highly precise metallic gear wheels are being fabricated, previously using PMMA based process. Starting from a non-optimized non-satisfying SU-8 process, significant process parameters for process optimization were identified using statistical design of experiment. By varying the significant process parameters, SU-8 process was further optimized with respect to critical aspect of sidewall bow and tilt of metallic structures. After the optimization, metallic parts fabricated using SU-8 process showed comparable quality as those fabricated using PMMA based process.
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