Crystal growth of eco-friendly, ultrawide bandgap aluminium gallium nitride (AlGaN) semiconductor-based ultraviolet-B (UVB) light-emitting diodes (LEDs) hold the potential to replace toxic mercury-based ultraviolet lamps. One of the major drawbacks in the utilisation of AlGaN-based UVB LEDs is their low efficiency of about 6.5%. The study investigates the influence of Al-graded p-type multi-quantum-barrier electron-blocking-layer (Al-grad p-MQB EBL) and Al-graded p-AlGaN hole source layer (HSL) on the generation and injection of 3D holes in the active region. Using the new UVB LED design, a significant improvement in the experimental efficiency and light output power of about 8.2% and 36 mW is noticed. This is accomplished by the transparent nature of Al-graded Mg-doped p-AlGaN HSL for 3D holes generation and p-MQB EBL structure for holes transport toward multi-quantum-wells via intra-band tunnelling. Based on both the numerical and experimental studies, the influence of sub-nanometre scale Ni film deposited underneath the 200 nm-thick Al-film p-electrode on the optical reflectance in UVB LED is investigated. A remarkable improvement in the efficiency of up to 9.6% and light output power of 40 mW, even in the absence of standard package, flip-chip, and resin-like lenses, is achieved on bare-wafer under continuous-wave operation at room temperature. The enhanced performance is attributed to the use of Al-graded p-MQB EBL coupled with softly polarised p-AlGaN HSL and the highly reflective 0.4 nm-thick Ni and 200 nm-thick Al p-electrode in the UVB LED. This research study provides a new avenue to improve the performance of high-power p-AlGaN-based UVB LEDs and other optoelectronic devices in III–V semiconductors.

The efficiency droop in 280-nm AlGaN multiple-quantum-well (MQW) ultraviolet (UV) light-emitting diodes (LEDs) is analyzed using the carrier rate equation. It is shown that the internal quantum efficiency (ηIQE), injection efficiency (ηinj), light-extraction efficiency (ηLEE), Shockley–Read–Hall recombination coefficient (A), and Auger coefficient (C) can be determined by the carrier rate equation using the theoretical radiative recombination coefficient (B), experimentally measured wavelength spectrum, and external quantum efficiency (ηEQE). The results show that the carrier spillover from the MQWs to the p-AlGaN layer is the main cause of the efficiency droop.

Improving the light-extraction efficiency (LEE) is a major issue for the development of deep-ultraviolet (DUV) light-emitting diodes (LEDs). For this improvement, we introduced a transparent p-AlGaN contact layer and a reflective p-type electrode. In this work, we investigated the improvements obtained by replacing conventional Ni/Au p-type electrodes with highly reflective Ni/Mg and Rh electrodes. The external quantum efficiencies (EQEs) of 279 nm DUV LEDs were increased from 4.2 to 6.6% and from 3.4 to 4.5% by introducing Ni/Mg and Rh p-type electrodes, respectively. The LEE enhancement factors for the Ni/Mg and Rh electrodes were 1.6 and 1.4, respectively. These results are explained by the fact that the measured reflectances of the Ni/Mg and Rh electrodes were approximately 80 and 55%, respectively. Moreover, it was concluded that a passivation layer is required for Ni/Mg electrodes to prevent the degradation of the LED properties by the oxidation of Mg.