Electrically pumped lasing from Germanium-on-Silicon pnn heterojunction diode structures is demonstrated. Room temperature multimode laser with 1mW output power is measured. Phosphorous doping in Germanium at a concentration over 4x10¹⁹cm^-3 is achieved. A Germanium gain spectrum of nearly 200nm is observed.

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We demonstrate CVD in situ doping of Ge by utilizing phosphorus delta-doping for the creation of a high dopant diffusion source. Multiple monolayer delta doping creates source phosphorous concentrations above 1 × 10 20 cm −3 , and uniform activated dopant concentrations above 4 × 10 19 cm −3 in a 600-800nm thick Ge layer after in-diffusion. By controlling dopant out-diffusion, near-complete incorporation of phosphorus diffusion source is shown.

The in situ n-type doping of Ge thin films epitaxial grown on Si substrates is limited to 1 × 1019 cm−3 by the phosphorous out-diffusion during growth at 600 °C. By studying the phosphorous diffusion in Ge with different background doping, we find that the diffusion coefficient is extrinsic and is enhanced 100 times in Ge doped at 1 × 1019 cm−3 compared to intrinsic diffusivity. To achieve higher phosphorous concentration, delta-doped layers are used as a dopant source for phosphorous in-diffusion. We show that the doping level is a result of the competition between in-diffusion and dopant loss. The high diffusivity at high n-type carrier concentration leads to a uniform distribution of phosphorous in Ge with the concentration above 3 × 1019 cm−3.

In situ synchrotron x-ray reflectivity is used to probe the early stages of pentacene growth in real time, under conditions relevant to the fabrication of organic thin film transistors. The results reveal that there is an interfacial water layer initially present on the SiO 2 substrate and that this water layer is still present at the interface after the deposition of a pentacene thin film. The thickness of the trapped interfacial water layer does not significantly change subsequent to film deposition, even after exposure to atmospheric pressure or during vacuum annealing at 70°C. However, a water layer is observed to form on the free surface of pentacene after sufficient exposure to water vapor, and the thickness of this layer can be reduced by subsequent vacuum annealing. These observations are correlated with organic thin film transistor mobilities measured at atmospheric pressure versus under vacuum.