The sections in this article are Introduction Modifiers in Catalysis Structural Modifiers Bonding Modifiers Promoters and Poisons for Some Important Catalytic Reactions Steam Reforming A Reactive Sites on Ni Catalysts B Alkali and Alkaline Earth Promoters for Ni Catalysts C Sulfur Poisoning of Ni Catalysts Water‐Gas Shift Reaction A Iron‐Based Catalysts: High‐Temperature Shift Catalysts a  Structural Modifiers in Iron‐Based Catalysts b  Metal and Metal Oxides as Promoters for Catalytic Activity B Copper‐Based Catalysts: Low‐Temperature Shift Catalysts a  Structural Modifiers b  Cesium Modifiers c  Sulfur Poisoning Methanation A Active Phase and Structural Modifiers B Electropositive Modifiers C Electronegative Modifiers F ischer– T ropsch Synthesis A Fe ‐Based Catalysts a  Active Phase and Structural Modifiers b  Metal Modifiers c  Sulfur Modification B Co‐Based Catalysts a  Electropositive Modifiers b  Electronegative Modifiers Ammonia Synthesis A Summary of Iron Ammonia Synthesis Catalysts B Ruthenium Catalysts for Ammonia Synthesis a  Active Phase and Structural Modifiers b  Metal Modifiers c  Poisoning Modifiers Case Studies of the Fundamental Basis of Modifier Action in Catalysis Ca promotion in Pd / Si O 2 Catalysts for Methanol Synthesis Direct Formation of Hydrogen Peroxide A Pd Catalysts for Direct H 2 O 2 Synthesis B Promotion Effects of Halide Anions Methane Reforming on Au  Ni Catalysts A Recent Studies on Ni Catalysts for Methane Reforming B Methane Reforming on Au ‐Modified Ni Catalysts Oxidative Dehydrogenation of Alkanes A Effects of Supports, Loading, and Preparation B Effect of Alkali Metal Additives on Vanadia Catalysts Summary

We describe surface plasmon enhancement by near-field interaction with Ag-scattering centers. By inserting mark trains between two Ag-scattering centers, the near-field signals were further enhanced in a super-resolution near-field structure. Observing the enhancement in more detail, it was found that surface plasmons are generated along the mark trains and are dispersed in a range of 1 µm along the marks and 40–50 nm normal to the multilayer stack.

Super-resolution near-field structure (Super-RENS) was prepared by a heliconwave-plasma sputtering method to improve the disk property that is combined with a magneto-optical (MO) recording disk. Antimony and silver-oxide mask layers were prepared by the method and refractive indices were measured. Recording and retrieving of signals beyond the resolution limit (<370 nm) were achieved for both mask cases. Attempts to optimize the disk structure were also made using a conventional sputtering method. The smallest mark size was around 200 nm and the highest carrier-to-noise ratio (CNR) was 30 dB for 300-nm mark and 22 dB for 250-nm, when using a laser wavelength of 780 nm and a numerical aperture of 0.53. We have found that there is a competing super-resolutional mechanism besides Super-RENS that appears when high readout laser power is applied. This mechanism played rather an important role at least in the mark-size range of 200-370 nm.