Initial vibrational and rotational energy distributions for the reactions of fluorine atoms with hydrogen chloride, bromide and iodide have been measured by the " arrested relaxation " chemiluminescence method. These reactions have been simulated by the classical trajectory method using semi-empirical 1.e.p.s. potential energy surfaces. Information theoretic analysis of the initial vibrational and rotational distributions has also been made.
Experimental and computational evidence of a surface roughness induced magnetic anisotropy in NiFe thin films coated onto substrates of various surface roughnesses is reported. Magnetic coercive fields of 15 nm NiFe thin films coated on substrates with approximately 7 nm average roughness were remarkably 233% larger than identical thin films coated onto smooth substrates with < 1 nm average roughness. The NiFe films coated onto rough substrates developed hard and easy axes, normally non-existent in NiFe Permalloy. A linear correlation of the incline angles of the hard axis hysteresis loops to the average roughness values of the individual substrates was observed, with 99% correlation level. Using a modified micromagnetics theory that incorporates the effects of surface roughness, it is shown the observed magnetic anisotropy arises due to the spatial anisotropy of the surface roughness, resulting in an effective in-plane uniaxial magnetic anisotropy with energy density up to 15 kJ/m 3 .
An apparatus for detecting infrared emission from chemical reactions at low pressures under arrested relaxation conditions is described. It has been used to record the emission from hydrogen fluoride formed in the reaction of atomic fluorine with hydrogen, methane, ethane and formaldehyde. Information-theoretic analysis of the initial vibrational and rotational energy distributions for the latter three reactions have been made. The results of a classical trajectory study, using a 1.e.p.s. potential energy surface, for the reaction between atomic fluorine and methane are presented.
Two-dimensional sputtered lithium atom density profiles have been calculated with a model for an argon glow discharge. Since the value of the sticking coefficient of sputtered atoms at the cell walls, which is needed as the boundary condition for calculating the behavior of the sputtered atoms, is not available from the literature, the calculations were performed for a range of sticking coefficient values. It is found that this parameter has a significant effect on the calculation results, and accurate knowledge of its value would therefore be required for an exact description of the behavior of sputtered atoms in a glow discharge. The density profiles calculated have also been compared with experimental results, obtained with concentration-modulated absorption spectrometry at the same discharge conditions and in the same cell geometry, in order to try to make reasonable estimates for the sticking coefficients.
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