Metal–insulator–semiconductor (MIS) photo‐electrocatalysts offer a pathway to stable and efficient solar water splitting. Initially motivated as a strategy to protect the underlying semiconductor photoabsorber from harsh operating conditions, the thickness of the insulator layer in MIS systems has recently been shown to be a critical design parameter which can be tuned to optimize the photovoltage. This study analyzes the underlying mechanism by which the thickness of the insulator layer impacts the performance of MIS photo‐electrocatalysts. A concrete example of an Ir/HfO2/n‐Si MIS system is investigated for the oxygen evolution reaction. The results of combined experiments and modeling suggest that the insulator thickness affects the photovoltage i) favorably by controlling the flux of charge carriers from the semiconductor to the metal electrocatalyst and ii) adversely by introducing nonidealities such as surface defect states which limit the generated photovoltage. It is important to quantify these different mechanisms and suggest avenues for addressing these nonidealities to enable the rational design of MIS systems that can approach the fundamental photovoltage limits. The analysis described in this contribution as well as the strategy toward optimizing the photovoltage are generalizable to other MIS systems.

Conspectus Photoelectrochemical water splitting is a promising avenue for sustainable production of hydrogen used in the chemical industry and hydrogen fuel cells. The basic components of most photoelectrochemical water splitting systems are semiconductor light absorbers coupled to electrocatalysts, which perform the desired chemical reactions. A critical challenge for the design of these systems is the lack of stability for the majority of desired semiconductors under operating water splitting conditions. One strategy to address this issue is to protect the semiconductor by covering it with a stabilizing insulator layer, creating a metal–insulator–semiconductor (MIS) architecture, which has demonstrated improved stability. In addition to enhanced stability, the insulator layer may significantly affect the electron and hole transfer, which governs the recombination rates. Furthermore, the insertion of an insulator layer leads to the introduction of additional insulator/electrocatalyst and insulator/semiconductor interfaces. These interfaces can impact the system’s performance significantly, and they need to be carefully engineered to optimize the efficiencies of MIS systems. In this Account, we describe our recent progress in shedding light on the critical role of the insulator and the interfaces on the performance of MIS systems. We discuss our findings by focusing on the concrete example of planar n-type Si protected by a HfO2 insulator layer and coupled to a Ni or Ir electrocatalyst that performs the oxygen evolution reaction, one of the water splitting half-reactions. To improve our fundamental understanding of the insulator layer, we precisely control the HfO2 insulator thickness using atomic layer deposition (ALD), and we perform a series of rigorous electrochemical experiments coupled with theory and modeling. We demonstrate that by tuning the insulator thickness, we can control the flux and recombination of photogenerated electrons and holes to optimize the generated photovoltage. Despite optimizing the thickness, we find that the maximum generated photovoltage in MIS systems is often significantly lower than the upper performance limit, i.e., there are additional losses in the system that could not be addressed by optimizing the insulator thickness. We identify the sources of these losses and describe strategies to minimize them by a combination of improving the semiconductor light absorption, removing nonidealities associated with interfacial defects, and finding alternative insulators with improved charge carrier selectivity. Finally, we quantify the improvements that can be obtained by implementing these specific strategies. Our collective work outlines strategies to analyze MIS systems, identify the sources of efficiency losses, and optimize the design to approach the fundamental performance limits. These general approaches are broadly applicable to photoelectrochemical materials that utilize sunlight to produce value-added chemicals.

Protective insulating layers between a semiconductor and an electrocatalyst enable otherwise unstable semiconductors to be used in photocatalytic water splitting. It is generally argued that in these systems the metal electrocatalyst must have work function properties that set a high inherent barrier height between the semiconductor and electrocatalyst and that the insulating layer should be as thin as possible. In this study we show that, for systems which suffer from inherently low barrier heights, the photovoltage can be significantly improved by tuning the thickness of the insulating layer. We demonstrate this in a case study of a system consisting of n-type silicon, a hafnium oxide protective layer (thickness 0–3 nm), and a Ni electrocatalyst. By optimizing the protective layer thickness, we observe increased efficiencies for photocatalytic oxygen evolution with a thick Ni electrocatalyst supported on n-Si. Our findings open avenues for the use of inexpensive electrocatalysts with favorable electrocatalytic and optical properties but poor work function characteristics.

Layered metal–insulator–semiconductor (MIS) materials represent a promising platform for photoelectrocatalytic chemical transformations including solar water splitting. The introduction of insulators in these materials was motivated by the need to improve the stability of many inherently unstable semiconductors with desirable optical properties. Recently, it has been demonstrated that insulators, in addition to improving the stability, can also improve performance. Specifically, it was shown that the generated photovoltage of some MIS systems is highly affected by optimizing insulator thickness. In this study, we quantify the extent to which insulator tuning can be used to optimize photovoltage. This is shown experimentally by comparing the performance of two systems with inherently different barrier heights but, otherwise, identical optical and electrocatalytic properties for the hydrogen evolution reaction (HER). These photocathodes contained a p-type Si light absorber, an HfO2 insulator, and a layered Ti–Pt or Al–Pt electrocatalyst. A comprehensive model was developed to illuminate the underlying processes governing performance and guide the design of MIS systems.

The materials that are receiving the most attention in photoelectrochemical water splitting are metallic nanoparticle electrocatalysts (np‐EC) attached to the surface of a semiconductor (SC) light absorber. In these multicomponent systems, the interface between the semiconductor and electrocatalysts critically affects performance. However, the np‐EC/SC interface remains poorly understood as it is complex on atomic scales, dynamic under reaction conditions, and inaccessible to direct experimental probes. This contribution sheds light on how the electrocatalyst/semiconductor interface evolves under reaction conditions by investigating the behavior of nickel electrocatalysts (as nanoparticles and films) deposited on silicon semiconductors. Rigorous electrochemical experiments, interfacial atomistic characterization, and computational modeling are combined to demonstrate critical links between the atomistic features of the interface and the overall performance. It is shown that electrolyte‐induced atomistic changes to the interface lead to (1) modulation of the charge carrier fluxes and a dramatic decrease in the electron/hole recombination rates and (2) a change in the barrier height of the interface. Furthermore, the critical roles of nonidealities and electrocatalyst coverage due to interfacial geometry are explored. Each of these factors must be considered to optimize the design of metal/semiconductor interfaces which are broadly applicable to photoelectrocatalysis and photovoltaic research.