Depth-profile analyses of insulating materials have been frequently carried out with an ion gun. The use of an ion gun generally results in preferential sputtering and poor depth resolution. Uniform sputtering of nonconductive powders can be achieved using a low-pressure radio-frequency plasma. The powders were dispersed in a conductive medium to enhance the charge dissipation. The technique was tested with many nonconductive powders including latex spheres, Y2O3, Zn2SiO4, BaSi2O5 and ZrO2. Preferential sputtering caused by charging was not observed in any of the samples studied. In the case of ZnS, preferential sputtering was detected but it was the result of multicrystallite orientations existing in the sample.
Comparison studies of plasma and ion gun sputtering on several types of non-flat surfaces (Au-plated Mo wires, W spheres) have shown a superior uniformity of lateral erosion in plasma sputtering. Conical structures, absent in plasma sputtering, have frequently formed in ion gun sputtering. A superior depth-resolution plasma depth profile consequently results.
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