A two-dimensional nano-scale measuring system utilizing a two-dimensional combined optical and X-ray interferometer (2D COXI) was developed for the standardization of measurement in the nanometer region. The system consists of a 2D COXI and an atomic force microscope (AFM). The designed, two-dimensional, flexure-stage scans and the cantilever tip probes the nanostructure of the specimen. The calibrated optical interferometers in the 2D COXI were used to measure two-dimensional nano-scale lengths. The accuracy of the optical interferometers was enhanced to enable sub-nanometer measurements. To demonstrate the nano-scale measuring system, we used it to measure the nano-scale pitches of gratings.
We have developed a two-dimensional nano-displacement measuring system utilizing a combined optical and x-ray interferometer (COXI). The system consists of optical interferometers for two-dimensional displacements and an x-ray interferometer. The x-ray interferometer was used to calibrate the non-linearity of the optical interferometers. The x-ray interferometer can subdivide the optical interference signal with 0.2 nm linear scales. The measured non-linearity of the heterodyne optical interferometer was less than 2 nm. The calibrated optical interferometers were used to measure two dimensional nanoscale displacements, and the accuracy of the optical interferometers was reduced to sub-nanometer after the compensation. To demonstrate the application of the system, we have measured the non-linearity of capacitive sensors using the calibrated optical interferometers.
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