This paper reports the highest etch depth of annealed Pyrex glass achieved by wet etching in highly concentrated HF solution, using a low stress chromiumgold with assistance of photoresist as masking layer. The strategies to achieve that are: increasing the etch rate of glass and simultaneously increasing the resistance of Cr/ Au mask in the etchant. By annealing the Pyrex glass and using a highly concentrated HF acid, a high etch rate can be obtained. Furthermore, a method to achieve a good resistance of the Cr/Au masking layer in the etching solution is to control the residual stress and to increase the thickness of Au deposition up to 1 lm. In addition, the presence of a hard baked photoresist can improve the etching performance. As a result, a 500-lm thick Pyrex glass wafer was etched through.
The nonlinear mechanical behavior of the cornea is closely correlated with the crimping morphology of collagen fibrils. The findings are expected to guide further research of corneal pathologies related to the abnormal microstructure of collagen fibrils.
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