Highly
ordered L10 FePt films with the highest degree
of [001] preferred orientation were prepared by multilayer deposition
on amorphous oxidized Si substrates and subsequent rapid thermal annealing
(RTA). We identify how to synthesize the preferred orientation structure
on the amorphous substrate, which we find to be critical to the optimal
formation of the [001] preferred orientation. This was achieved by
controlling the heating rate of the RTA process. We also identify
how the influence of the beam power, sputtering working pressure,
and annealing time affect the structural and magnetic properties of
FePt films. For example, a L10 preferred orientation and
increased magnetic anisotropy of the FePt films have been attained
by composition and in-plane tensile stress adjustments. The perpendicular
field coercivity was enhanced by increasing the RTA heating rate,
which increased the dislocation densities induced by strain. We also
found that the strain fields of dislocations in FePt L10 films can act as the dominant pinning sites that restrict domain
wall motion, increasing the coercivity. We find that this is due to
the spatial range of the strain fields associated with dislocations
being similar to the domain wall width in the films.
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