Modification of vacuum chamber surface properties by introducing a layer of material with low secondary electron yield (SEY) is one of the most useful solutions to suppress the electron-cloud in high-energy particle accelerators. In the present work, amorphous carbon thin films have been produced by DC magnetron sputtering with Neon and Argon sputtering gases. Microstructures of the thin films have been characterized by using scanning electron microscopy (SEM) and atomic force microscopy (AFM). The sp2 and sp3 hybridized carbon atoms are evaluated using X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy. The amorphous carbon coatings comprise tiny granularities of tens of nanometers. The amorphous carbon films show more graphite-like properties as revealed by XPS and Raman spectroscopy. The secondary electron emission measurement results indicate that amorphous carbon coatings present SEY of <1.2. The thin film deposited by Ne exhibits a higher sp2 hybridization content, leading to a slightly lower SEY compared with the film produced with Ar.
Aluminum-copper alloys are popular for many applications that take advantage of the combination of properties in the alloys. This paper describes the use of multiple advanced failure analysis tools to analyze the physical and chemical properties of Al-Cu alloy thin films.
Determination of compositional distribution for solder material is of particular interest in the area of failure analysis, specifically in the investigation of various solder alloy formations during the joining processes and interconnection failures. In this paper, we explored several advanced techniques such as time-of-flight secondary ion mass spectrometry (TOF SIMS), X-ray photoelectron spectroscopy (XPS) and energy dispersive X-ray spectroscopy (ED X) for characterizing the composition of SnAgCu solder material. Each analysis technique has its advantages in the information attained, thus stimulating multi-technique approaches for material analysis in future.
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