Ocean waste that continues moving in the water has been a problem until now. This has stimulated marine debris cleaning technology to emerge. This research sought to evaluate the effectiveness of waste collection using a monohull and catamaran fitted with a forward conveyor. The Reynolds Average Navier Stokes (RANS)-based numerical simulation research is used to predict flow pattern characteristics, velocity contour, wave pattern, pressure distribution, and ship resistance. The current research focuses on the impact of a round-bilge-type monohull and inner flat-type catamaran hull front shape on waste collection behavior by applying numerical methods. The multiphase solver numerical configuration supplied with OpenFOAM v2112 has been verified and validated using the Delft catamaran 372 with Froude numbers 0.3. The effect of free surface on resistance and flow characteristics was evaluated by comparing these two models. The results show the behavior of marine debris collection due to the flow characteristics of both models. The marine debris flows much more conveniently through the conveyor fitted in front of the catamaran model than in the monohull model. In addition, considering the front-side hull flow, the catamaran model is superior since marine debris is able to approach the ship easily. However, the monohull model is faster at bringing marine debris closer to the conveyor, particularly at the location in front of the conveyor.
ArF immersion lithography is essential to extend optical lithography. In this study, we characterized the immersion process on production wafers. Key lithographic manufacturing parameters, overlay, CD uniformity, depth of focus (DOF), optical proximity effects (OPE), and defects are reported. Similar device electrical performance between the immersion and the dry wafers assures electrical compatibility with immersion lithography. The yield results on 90-nm Static Random Access Memory (SRAM) chips confirm doubling of DOF by immersion as expected. Poly images of the 65-nm node from a 0.85NA immersion scanner are also shown.
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