This study investigates the surface chemistry and the ordering characteristics of coadsorbed hydrogen and chlorine atoms, generated by the exposure of the Si͑100͒ surface to gas-phase HCl molecules at various substrate temperatures, by scanning tunneling microscopy ͑STM͒, core-level photoemission spectroscopy, and Monte Carlo simulation. Experimental results show that saturation exposure to HCl causes all surface dangling bonds to be terminated by the two fragments H and Cl atoms and that the number of H-terminated sites exceeds that of Cl-terminated ones by more than 10%. This finding suggests that, in addition to the dominant dissociative chemisorption, atomically selective chemisorption or atom abstraction occurs. STM images reveal that some Cl-terminated sites form patches with a local 2 ϫ 2 structure at 110 K and that the degree of ordering is reduced as the substrate temperature increases. Results of Monte Carlo simulations demonstrate the importance of including dissociative fragment-adsorbate interactions during the random adsorption of diatomic molecules. Comparing the correlations between Cl-terminated sites identified from STM images and those predicted by simulation reveals two effective interaction energies of 8.5Ϯ 2.0 and 3.5Ϯ 2.0 meV between a dissociative fragment Cl atom and a nearest neighboring Cl adsorbates in the same dimer row and in the adjacent row, respectively.
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