To improve adhesion of a‐SiC:H thin films on a titanium alloy (TA6V), a nitriding is performed in nitrogen, argon, hydrogen gas mixture using a hybrid microwave/low frequency plasma device. The experimental approach shows that the scratch resistance is strongly related to the properties of the nitrogen diffusion layer. The surface hardening induced by the nitriding process adapts the abrupt variation of the properties at the substrate–coating interface and limits the substrate deformation. To improve our understanding of the mechanical behaviour of the couple substrate/coating we have modelled a spherical nanoindentation test. We have shown that the tensile normal stress at the substrate–coating interface may be responsible for film delamination.
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