We provide the initial
demonstration of a general thin film deposition
technique that leverages the unique solubility properties of supercritical
fluids. The technique is the solution-phase analogue of physical vapor
deposition and allows thin films of a semiconducting polymer to be
grown without the need for in situ chemical reactions. Film growth
is approximately linear with time, indicating that film thickness
can be controlled in a straightforward manner by varying the time
of deposition. To further demonstrate the flexibility of the technique,
we demonstrate precise control over the location of material deposition
using a combination of photolithography and resistive heating. The
potential for scalable manufacturing is demonstrated by use of a master
to control deposition onto a flexible polymer film. Finally, we demonstrate
a unique deposition capability of this technique by depositing patterns
onto the curved interior of a hemisphere made from a silicone elastomer.
This capability is not possible with any printing or line-of-sight
deposition technique. More generally, the ability to control the deposition
of solution processed materials with high accuracy provides the long
sought after bridge between top-down and bottom-up self-assembly.
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