Ultra-precise metal optics are key components of sophisticated scientific instruments in astronomy and space applications. Especially for cryogenic applications, a detailed knowledge and the control of the coefficient of thermal expansion (CTE) of the used materials are essential. Reflective optical components in IR- and NIR-instruments primarily consist of the aluminum alloy Al6061. The achievable micro-roughness of diamond machined and directly polished Al6061 does not fulfill the requirements for applications in the visible spectral range. Electroless nickel enables the reduction of the mirror surface roughness to the sub-nm range by polishing. To minimize the associated disadvantageous bimetallic effect, a novel material combination for cryogenic mirrors based on electroless nickel and hypereutectic aluminum-silicon is investigated. An increasing silicon content of the aluminum material decreases the CTE in the temperature range to be considered. This paper shows the CTE for aluminum materials containing about 42 wt% silicon (AlSi42) and for electroless nickel with a phosphorous content ranging from 10.5 to 13 %. The CTE differ to about 0.5 × 10-6 K-1 in a temperature range from -185 °C (LN2) to 100 °C. Besides, the correlations between the chemical compositions of aluminum-silicon materials and electroless nickel are shown. A metrology setup for cryo-interferometry was developed to analyze the remaining and reversible shape deviation at cryogenic temperatures. Changes could be caused by different CTE, mounting forces and residual stress conditions. In the electroless nickel layer, the resulting shape deviation can be preshaped by deterministic correction processes such as magnetorheological finishing (MRF) at room temperature
Ultra-precise metal optics are key components of sophisticated scientific instrumentation in astronomy and space applications, covering a wide spectral range. Especially for applications in the visible or ultra-violet spectral ranges, a low roughness of the optics is required. Therefore, a polishable surface is necessary. State of the art is an amorphous nickel-phosphorus (NiP) layer, which enables several polishing techniques achieving a roughness of <1 nm RMS. Typically, these layers are approximately 30 μm to 60 μm thick. Deposited on Al6061, the bimetallic effect leads to a restricted operational temperature, caused by different coefficients of thermal expansion of Al6061 and NiP. Thinner NiP layers reduce the bimetallic effect. Hence, the possible operating temperature range. A deterministic shape correction via Magnetorheological Finishing of the substrate Al6061 leads to low shape deviations prior to the NiP deposition. This allows for depositing thin NiP-layers, which are polishable via a chemical mechanical polishing technique aiming at ultra-precise metal optics. The present article shows deposition processes and polishability of electroless and electrolytic NiP layers with thicknesses between 1 μm and 10 μm
For ground-and spaced based applications, Ag coated reflectors are indispensable because of their high reflectivity. The transport, assembling and storage of these reflectors takes a long time, before they are finally commissioned for the actual applications. To endure this period without a decrease of reflectivity, protective coatings with a final layer, which offers a high resistance to aqueous solutions and a low mechanical stress should be used. These criteria were taken into account for the selection of a final layer for a protected Ag-coating, which was applied for reflectors utilized in the CRIRES +instrument (an IR spectrograph used at the VLT). Reactively sputtered Al2O3, SiO2 and Si3N4 layers were investigated with regard to these criteria. In aqueous (basic) solutions, the investigated Si3N4 layers are more stable than the SiO2 layers, and the SiO2 layers are more stable than the Al2O3 layers. This shows the influence of the intrinsic material properties. The mechanical stress of the sputtered layers depends on the deposition conditions and thus on the selected parameters. A Si3N4 layer with a high resistance to aqueous solutions also offers a low and stable mechanical stress. Therefore, the depositionparameters which have been used for this layer were applied for sputtering the final layer of the protected Ag-coating for the reflectors.
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