We have investigated nitrogen doping effects on the structure and crystallinity of bamboo-shaped multiwalled carbon nanotubes (BS-MWNTs) by means of x-ray photoemission spectroscopy (XPS) and transmission electron microscopy. By controlling the NH3/C2H2 flow ratio during the chemical vapor deposition, the nitrogen concentrations of 0.4% to 2.4% were obtained. According to the XPS measurements, the increasing nitrogen concentration gave rise to an increase of the N-sp3 C bonds as well as the deterioration of the crystallinity of the BS-MWNTs. Besides, the N-sp3 C bonds were found to prevail over the N-sp2 C bonds above 5% nitrogen concentration. At higher nitrogen concentrations, the BS-MWNTs showed shorter compartment distances, presumably due to the suppressed surface diffusion of carbon on the catalyst particles.
On-wire lithography (OWL) fabricated nanogaps are used as a new testbed to construct molecular transport junctions (MTJs) through the assembly of thiolated molecular wires across a nanogap formed between two Au electrodes. In addition, we show that one can use OWL to rapidly characterize a MTJ and optimize gap size for two molecular wires of different dimensions. Finally, we have used this new testbed to identify unusual temperature-dependent transport mechanisms for alpha,omega-dithiol terminated oligo(phenylene ethynylene).
We report the first observation of anomalous diffusion in nanometer scale direct deposition processes utilizing dip-pen nanolithography (DPN). DPN permits quite general nanostructure patterns to be drawn on flat surfaces. Here we demonstrate experimentally, and discuss theoretically, the situation in which the molecular ink in DPN binds weakly to the surface. We observe, for the weak-binding case of 1-dodecylamine on mica, that anomalous diffusion occurs, leading to nearly fractal deposition patterns.
The controlled patterning of nanomaterials presents a major challenge to the field of nanolithography because of differences in size, shape and solubility of these materials. Matrix-assisted dip-pen nanolithography and polymer pen lithography provide a solution to this problem by utilizing a polymeric matrix that encapsulates the nanomaterials and delivers them to surfaces with precise control of feature size.
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