Tomographic imaging of the ionosphere is a recently developed technique that uses integrated measurements and computer reconstructions to determine electron densities. The integral of electron density along vertical or oblique paths is obtained with radio transmissions from low-earth-orbiting (LEO) satellite transmitters to a chain of receivers on the earth’s surface. Similar measurements along horizontal paths can be made using transmissions from Global Position System (GPS) navigation satellites to GPS receivers on LEO spacecraft. Also, the intensities of extreme ultraviolet (EUV) emissions can be measured with orbiting spectrometers. These intensities are directly related to the integral of the oxygen ion and electron densities along the instrument line of sight. Two-dimensional maps of the ionospheric plasma are produced by analyzing the combined radio and EUV data using computerized ionospheric tomography (CIT). Difficulties associated with CIT arise from the nonuniqueness of the reconstructions, owing to limited angle measurements or nonoptimal receiver location. Improvements in both reconstruction algorithms and CIT measurement systems are being implemented to overcome these difficulties. New imaging systems being developed employ CIT for large area mapping of the plasma densities in the ionosphere.
SUMMARY
The epitaxial growth of As on the (111) and (100) faces of Si and the (111) face of Ge has been studied with vacuum tunnelling microscopy. The (111) faces of both semiconductors display a principally 1×1 termination, but differ with the presence of point defects on the Si(111): As‐1×1 surface and trenches separating large (∼ 100 Å) domains on the Ge(111): As‐1×1 surface. I‐V characteristics of the tunnel junction show a surface energy gap of approximately 1·9 eV for the Si(111): As‐1×1 surface and 0·9 eV for the Ge(111): As‐1×1 surface, in good agreement with recent theoretical calculations for these systems. As deposition on Si(001) results in a nominal 2×1 reconstruction of symmetric As dimers and elimination of missing dimer defects characteristic of the native Si(001) 2×1 surface. Further studies on vicinal, double‐stepped substrates shows the orientation of the dimers with respect to the substrate depends critically on the substrate temperature during the growth phase, with destruction of the single principle domain surface order occurring at temperatures in excess of 700°C.
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