We report on high-performance thermochromic ZrO2/V0.982W0.018O2/ZrO2 coatings with a low transition temperature prepared on glass by a low-temperature scalable deposition technique. The V0.982W0.018O2 layers were deposited by a controlled high-power impulse magnetron sputtering of V target, combined with a simultaneous pulsed DC magnetron sputtering of W target to reduce the transition temperature to 20–21 °C, at a low substrate surface temperature of 330 °C in an argon–oxygen gas mixture. ZrO2 antireflection layers both below and above the thermochromic V0.982W0.018O2 layers were deposited at a low substrate temperature (< 100 °C). A coating design utilizing a second-order interference in the ZrO2 layers was applied to increase both the luminous transmittance (Tlum) and the modulation of the solar transmittance (ΔTsol). The ZrO2/V0.982W0.018O2/ZrO2 coatings exhibit Tlum up to 60% at ΔTsol close to 6% for a V0.982W0.018O2 thickness of 45 nm, and Tlum up to 50% at ΔTsol above 10% for a V0.982W0.018O2 thickness of 69 nm.

No abstract

Ultraviolet light has been shown to be effective in inhibiting the electroless deposition of Cu, Ni, and Co if applied after sensitization, and of Ni and Co after activation. Electron microscopic techniques are applied to investigate these phenomena. It is concluded that structural changes in the sensitizing and activating agents induced by the u.v. light are connected with the inhibition of metal deposition.

No abstract

No abstract