The polarity is found to be a key parameter for the growth of high quality epitaxial GaN films on sapphire (00.1) substrates. A model is suggested which may consistently explain the observed influence of the process parameters on the polar orientation of the epitaxial film. A simple etching technique is proposed for quick distinction of the film polarity. The assignment of the etching behavior to the proper crystal structure is achieved by an analysis of the respective two-dimensional photoelectron diffraction patterns.

Orthodox etching of HVPE-grown GaN in molten eutectic of KOH + NaOH (E etch) and in hot sulfuric and phosphoric acids (HH etch) is discussed in detail. Three size grades of pits are formed by the preferential E etching at the outcrops of threading dislocations on the Ga-polar surface of GaN. Using transmission electron microscopy (TEM) as the calibration tool it is shown that the largest pits are formed on screw, intermediate on mixed and the smallest on edge dislocations. This sequence of size does not follow the sequence of the Burgers values (and thus the magnitude of the elastic energy) of corresponding dislocations. This discrepancy is explained taking into account the effect of decoration of dislocations, the degree of which is expected to be different depending on the lattice deformation around the dislocations, i.e. on the edge component of the Burgers vector. It is argued that the large scatter of optimal etching temperatures required for revealing all three types of dislocations in HVPE-grown samples from different sources also depends upon the energetic status of dislocations. The role of kinetics for reliability of etching in both etches is discussed and the way of optimization of the etching parameters is shown.

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In order to resolve any doubt in lattice polarity calibrations, a given undoped GaN layer deposited on (0001) sapphire by metalorganic chemical vapor deposition and a given high-pressure-grown GaN single crystal have been studied by three different techniques: Hemispherically scanned x-ray photoelectron diffraction, convergent beam electron diffraction, and chemical etching. We conclude that Ga-polar surfaces are resistant to a 200 °C molten NaOH+KOH etching whereas N-polar surfaces are chemically active. All the observed flat GaN films grown on (0001) sapphire have Ga polarity. On the contrary, the native flat faces of undoped GaN bulk crystals have N polarity.

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Influence of the carrier gas composition on morphology, dislocations, and microscopic luminescence properties of selectively grown GaN by hydride vapor phase epitaxyWe study radiative and nonradiative recombination at individual dislocations in GaN by cathodoluminescence performed in a transmission electron microscope. The dislocations are produced by indentation of dislocation free single crystals and have a-type Burgers vectors (b ϭ1/3͗112 0͘). They are aligned along ͗112 0͘ directions in the basal plane. Our direct correlation between structural and optical properties on a microscopic scale yields two main results: ͑i͒ 60°-basal plane dislocations show radiative recombination at 2.9 eV; ͑ii͒ screw-type basal plane dislocations act as nonradiative recombination centers. We explain the nonradiative recombination by splitting this dislocation into 30°partials that have dangling bonds in the core. The dissociation width of these dislocations is Ͻ2 nm.