A majority of the point defects in GaN that are responsible for broad photoluminescence (PL) bands remain unidentified. One of them is the green luminescence band (GL2) having a maximum at 2.35 eV which was observed previously in undoped GaN grown by molecular-beam epitaxy in Ga-rich conditions. The same PL band was observed in Mg-doped GaN, also grown in very Ga-rich conditions. The unique properties of the GL2 band allowed us to reliably identify it in different samples. The best candidate for the defect which causes the GL2 band is a nitrogen vacancy (V N). We propose that transitions of electrons from the conduction band to the +/2+ transition level of the V N defect are responsible for the GL2 band in high-resistivity undoped and Mg-doped GaN.

Point defects in high-purity GaN layers grown by hydride vapor phase epitaxy are studied by steady-state and time-resolved photoluminescence (PL). The electron-capture coefficients for defects responsible for the dominant defect-related PL bands in this material are found. The capture coefficients for all the defects, except for the green luminescence (GL1) band, are independent of temperature. The electron-capture coefficient for the GL1 band significantly changes with temperature because the GL1 band is caused by an internal transition in the related defect, involving an excited state acting as a giant trap for electrons. By using the determined electron-capture coefficients, the concentration of free electrons can be found at different temperatures by a contactless method. A new classification system is suggested for defect-related PL bands in undoped GaN.

The yellow luminescence band was studied in undoped and Si-doped GaN samples by steady-state and time-resolved photoluminescence. At low temperature (18 K), the zerophonon line (ZPL) for the yellow band is observed at 2.57 eV and attributed to electron transitions from a shallow donor to a deep-level defect. At higher temperatures, the ZPL at 2.59 eV emerges, which is attributed to electron transitions from the conduction band to the same defect. In addition to the ZPL, a set of phonon replicas is observed, which is caused by the emission of phonons with energies of 39.5 meV and 91.5 meV. The defect is called the YL1 center. The possible identity of the YL1 center is discussed. The results indicate that the same defect is responsible for the strong YL1 band in undoped and Si-doped GaN samples.

The optical properties of high-quality GaN co-doped with silicon and zinc are investigated by using temperature-dependent continuous-wave and time-resolved photoluminescence measurements. The blue luminescence band is related to the Zn Ga acceptor in GaN:Si,Zn, which exhibits an exceptionally high absolute internal quantum efficiency (IQE). An IQE above 90% was calculated for several samples having different concentrations of Zn. Accurate and reliable values of the IQE were obtained by using several approaches based on rate equations. The concentrations of the Zn Ga acceptors and free electrons were also estimated from the photoluminescence measurements.

Two yellow luminescence bands related to different defects have been revealed in undoped GaN grown by hydride vapor phase epitaxy (HVPE). One of them, labeled YL1, has the zero-phonon line (ZPL) at 2.57 eV and the band maximum at 2.20 eV at low temperature. This luminescence band is the ubiquitous yellow band observed in GaN grown by metalorganic chemical vapor deposition, either undoped (but containing carbon with high concentration) or doped with Si. Another yellow band, labeled YL3, has the ZPL at 2.36 eV and the band maximum at 2.09 eV. Previously, the ZPL and fine structure of this band were erroneously attributed to the red luminescence band. Both the YL1 and YL3 bands show phonon-related fine structure at the high-energy side, which is caused by strong electron-phonon coupling involving the LO and pseudo-local phonon modes. The shapes of the bands are described with a one-dimensional configuration coordinate model, and the Huang-Rhys factors are found. Possible origins of the defect-related luminescence bands are discussed.

An unusual temperature dependence of the photoluminescence lifetime for the green luminescence (GL) band in GaN is explained. This GL is caused by an internal transition of electrons from an excited state to the ground state of the 0/+ transition level of the isolated C N defect. The excited state appears only after the C N defect captures two photogenerated holes. The electron capture by the excited state is nonradiative, yet the lifetime of such can be probed by the temperature variation of the GL lifetime, whose temperature dependence shows a classic case of electron capture by a giant trap.

We have studied the thermal quenching of the ultraviolet luminescence band with a maximum at about 3.25 eV in p-type Mg-doped GaN. The characteristic temperature of the thermal quenching of photoluminescence (PL) gradually shifted to higher temperatures with increasing excitation intensity. This effect is explained by a population inversion of charge carriers at low temperatures, which suddenly converts into a quasiequilibrium population as the temperature increases above the characteristic value. Tunable quenching of PL has been observed only in some of the GaN:Mg samples. The absence of the tunable quenching of PL in another group of GaN:Mg samples is preliminarily attributed to different types of dominant nonradiative defects in the two groups of samples.

The investigation and identification of point defects in GaN is crucial for improving the reliability of lightemitting and high-power electronic devices. The RY3 defect with a characteristic emission band at about 1.8 eV is often observed in photoluminescence (PL) spectra of n-type GaN grown by hydride vapor phase epitaxy, and it exhibits unusual properties. Its emission band consists of two components: a fast (10-ns lifetime) RL3 with a maximum at 1.8 eV and a slow (100-300 μs lifetime) YL3 with a maximum at 2.1 eV and zero-phonon line at 2.36 eV. In steady-state PL measurements, the YL3 component emerges with increasing temperature from 90 to 180 K, concurrently with a decrease in the RL3 intensity. The activation energy of both processes is about 0.06 eV. In time-resolved PL, the YL3 intensity abruptly rises when the RL3 intensity begins to saturate. These and other phenomena can be explained using a model of an acceptor with two excited states. A delocalized, effective-mass state at about 0.2 eV above the valence band captures photogenerated holes. These holes transition to the ground state, which produces the RL3 component with a lifetime of ∼10 ns. Alternatively, they may nonradiatively transition over a 0.06 eV-high barrier to a localized excited state with a level at 1.13 eV above the valence band. Recombination of free electrons or electrons at shallow donors with the holes at this localized excited state is responsible for the YL3 component. The relative intensities of the RL3 and YL3 components are dictated by the probabilities of holes at the shallow excited state to transition to the ground or to the localized excited states. Transition metals and complex defects are considered as the main candidates for the RY3 center.