Silicon nanocrystals (Si NCs) are intensively studied for optoelectronic and biological applications due to having highly attractive features such as band engineering. Although doping is often used to control the optical and electrical properties, the related structural properties of solely doped and codoped Si NCs are not well-understood. In this study, we report the boron (B) and/or phosphorus (P) distribution in Si NCs embedded in borosilicate glass (BSG), phosphosilicate glass (PSG), and borophosphosilicate glass (BPSG) using atom probe tomography (APT). We compared solely and codoped Si NCs grown at different temperatures so that we may compare the effects of codoping and temperature on the B and/or P distribution. Proximity histograms and cluster analyses reveal that there exist boron-rich layers surrounding Si NCs and also B–P clusters within the Si NCs. Raman spectra also show a structural change between codoped Si NCs in solids and free-standing codoped Si NCs. These results lead us to understand that codoped Si NCs disperse in polar solvents.

Nanometer wide silicon filaments embedded in an amorphous silicon oxide matrix are grown at low temperatures over a large area. The optical and electrical properties of these mixed-phase nanomaterials can be tuned independently, allowing for advanced light management in high efficiency thin-film silicon solar cells and for band-gap tuning via quantum confinement in third-generation photovoltaics.

We fabricated p-i-n diodes by sputtering alternating layers of silicon dioxide and silicon rich oxide with a nominal atomic ratio O/Si=0.7 onto quartz substrates with in situ boron for p-type and phosphorus for n-type doping. After crystallization, dark and illuminated I-V characteristics show a diode behavior with an open circuit voltage of 373 mV. Due to the thinness of the layers and their corresponding high resistivity, lateral current flow results in severe current crowding. This effect is taken into account when extracting the electronic bandgap based on temperature dependent diode I-V measurements.

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Silicon quantum dot (Si QD) solar cells offer the potential to tune the effective band gap through quantum confinement and hence allow fabrication of optimised tandem devices in one growth run in a thin film process. Previous work in our group has shown how such cells can be fabricated by sputtering of thin layers of silicon rich oxide sandwiched between a stoichiometric oxide that on annealing crystallise to form Si QDs of uniform and controllable size. Doping multilayers with P and B allows formation of a rectifying junction with an effective band gap of 1.8 eV, which can give an open circuit voltage (VOC) of almost 500 mV. However, the doping behaviour of P and B in these QD materials is not well understood. In addition P and B have big but opposite effects on QD crystallisation, with P(B) forming larger (smaller) QDs than for undoped material. Two possible models for the doping mechanisms in these materials are explored: one relying on doping of a sub‐oxide region around the Si QDs and the other based on the differing nucleation effects of P and B. In addition initial results on hetero‐interfaces in the QD superstructure are assessed as a means to improve vertical current transport, and the effects of hydrogenation on improving VOC by passivating defects. Routes to incorporating these explanations for doping and other structural improvements are discussed as means of optimising the performance of these Si QD cells. Copyright © 2010 John Wiley & Sons, Ltd.

A narrow size distribution of quantum dots (QDs) is needed for their application in photovoltaics but collection of such information is difficult. This paper demonstrates the application of Raman spectroscopy as a characterisation tool to extract the size distribution and crystalline fraction of Si QD samples fabricated through the sputter-anneal method. Measured Raman spectra of Si QD materials are de-convoluted into four components according to their origins and Raman scattering by Si QD cores is

The concept of third-generation photovoltaics is to significantly increase device efficiencies whilst still using thin-film processes and abundant non-toxic materials. A strong potential approach is to fabricate tandem cells using thin-film deposition that can optimise collection of energy in a series of cells with decreasing band gap stacked on top of each other. Quantum dot materials, in which Si quantum dots (QDs) are embedded in a dielectric matrix, offer the potential to tune the effective band gap, through quantum confinement, and allow fabrication of optimised tandem solar cell devices in one growth run in a thin-film process. Such cells can be fabricated by sputtering of thin layers of silicon rich oxide sandwiched between a stoichiometric oxide that on annealing crystallise to form Si QDs of uniform and controllable size. For approximately 2-nm diameter QDs, these result in an effective band gap of 1.8 eV. Introduction of phosphorous or boron during the growth of the multilayers results in doping and a rectifying junction, which demonstrates photovoltaic behaviour with an open circuit voltage (VOC) of almost 500 mV. However, the doping behaviour of P and B in these QD materials is not well understood. A modified modulation doping model for the doping mechanisms in these materials is discussed which relies on doping of a sub-oxide region around the Si QDs.

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