A simulation of the profile of holographically recorded structures in photoresists is performed. In addition to its simplicity this simulation can be used to take into account the effects that arise from exposure, photosensitization, development, and resolution of positive photoresists. We analyzed the effects of isotropy of wet development, nonlinearity of the photoresist response curve, background light, and standing waves produced by reflection at the film-substrate interface by using this simulation, and the results agree with the experimentally recorded profiles.
A theoretical model is developed to compute the resulting profile of structures holographical ly recorded in photoresists . The model takes int.o account the effects of exposure , photosensitization and isotropy of wet development . The effects of isotropy of wet development , non-i inearity of the photoresist response curve , background -1 ight , and the stationary waves produced by reflection at the fi lm-substrate interface are analyzed using the model and the results are experimental ly confirmed.
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