Pathogenic microbes are the main cause of various undesired infections in living organisms, including humans. Most of these infections are favored in hospital environments where humans are being treated with antibiotics and where some microbes succeed in developing resistance to such drugs. As a consequence, our society is currently researching for alternative, yet more efficient antimicrobial solutions. Certain natural and synthetic polymers are versatile materials that have already proved themselves to be highly suitable for the development of the next-generation of antimicrobial systems that can efficiently prevent and kill microbes in various environments. Here, we discuss the latest developments of polymeric structures, exhibiting (reinforced) antimicrobial attributes that can be assembled on surfaces and coatings either from synthetic polymers displaying antiadhesive and/or antimicrobial properties or from blends and nanocomposites based on such polymers.

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In this study we have employed a polymer processing method based on solvent vapor annealing in order to condense relatively large amounts of solvent vapors onto thin films of block copolymers and thus to promote their self-assembly into ordered nanostructures. As revealed by the atomic force microscopy, a periodic lamellar morphology of poly(2-vinylpyridine)-b-polybutadiene and an ordered morphology comprised of hexagonally-packed structures made of poly(2-vinylpyridine)-b-poly(cyclohexyl methacrylate) were both successfully generated on solid substrates for the first time.

In this study, we employed a polymer processing method based on solvent vapor annealing in a confined environment to swell-rich thin films of polybutadiene-b-poly(2-vinylpyridine)-b-poly(ethylene oxide) triblock copolymers and to promote their crystallization. As revealed by optical and atomic force microscopy, thin films of triblock copolymers containing a rather short crystalline poly(ethylene oxide) block that was massively obstructed by the other two blocks were unable to crystallize following the spin-casting process, and their further swelling in solvent vapors was necessary in order to produce polymeric crystals displaying a dendritic morphology. In comparison, thin films of triblock copolymers containing a much longer poly(ethylene oxide) block that was less obstructed by the other two blocks were shown to crystallize into dendritic structures right after the spin-casting procedure, as well as upon rich swelling in solvent vapors.

Development of a standard dosimetric facility with protection against external radiation background for the metrological support of highly sensitive radiation monitoring devices in accordance with the requirements of international standards .