The aim of this study was to produce thin films of ternary cobalt-nickel-iron (Co-NiFe) alloy by electrochemical deposition method at different electrodeposition potentials in a sulfate solution (0.15 M CoSO 4 + 0.2 M NiSO 4 + 0.005 M FeSO 4 ). The Co-Ni-Fe alloy thin films were electrodeposited on indium-doped tin oxide (ITO) coated on a conducting glass substrate. Voltammetric studies indicated the potential range between -1.10 to -1.30 V (SCE) for successful deposition of Co, Ni and Fe. The energy dispersive X-ray (EDX) analysis indicated that the films exhibited anomalous behavior with Ni content significantly increased, whereas the Co and Fe content decreased as the electrodeposition potentials reached more negative values. The scanning electron microscopy (SEM) study showed that the electrodeposited films were uniform for all applied potential values and larger particles were formed when higher electrodeposition potentials were applied. Investigation by X-ray diffraction (XRD) revealed that the dominant phase in the deposited film was amorphous Co-Ni-Fe. Hysteresis curves of the ternary alloy film obtained from vibrating sample magnetometer results prove that the alloy is ferromagnetic. The coercivity mechanism of the Co-Ni-Fe films has obeyed Neel's relation which is thickness dependence.

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