Purpose This study aims to contribute to the numerical modelling of drop impact on a flip-chip component assembled on printed circuit boards using solder micro-bumps. This contribution is based on the introduction of non-linear fracture mechanics in the numerical approach. Design/methodology/approach The integration of non-linear fracture mechanics into the numerical approach requires the proposal and validation of several simplifying assumptions. Initially, a dynamic 3D model was simplified to a dynamic 2D model. Subsequently, the dynamic 2D model is replaced with an equivalent static 2D model. The equivalent static 2D model was used to perform calculations considering the non-linear fracture mechanics. A crack was modelled in the critical bump. The J-integral was used as a comparative parameter to study the effects of crack length, crack position and chip thickness on the fracture toughness of the solder bump. Findings The different simplifying assumptions were validated by comparing the results obtained by the various models. Numerical results showed a high risk of failure at the critical solder bump in a zone close to the intermetallic layer. The obtained results were in agreement with the post-test observations using the “Dye and Pry” methods. Originality/value The originality of this study lies in the introduction of non-linear fracture mechanics to model the mechanical response of solder bumps during drop impact. This study led to some interesting conclusions, highlighting the advantage of introducing non-linear fracture mechanics into the numerical simulations of microelectronic components during a drop impact.
Given the growing global demand for high-performance microcomponents, while keeping the size of the microcomponents as small as possible, several manufacturers have chosen to increase the number of thin layers to increase the integration density. These thinner layers cause warping-type deformations during processing. In this study, warping during the development of a stacking composed of a silicon substrate coated with two thin layers, one dielectric in undoped silicate glass (USG) and the other metallic in platinum, was numerically analyzed and validated by comparison with experimental measurements. The numerical study presented in this paper has several components that make it simple and reliable. Indeed, simplifications of the loading conditions were introduced and validated by comparison with experimental results. Another part of the simplification is to integrate a homogenization approach to reduce the number of calculations. The efficiency and precision of the homogenization approach were validated for the mechanical and thermomechanical models by comparing the heterogeneous and homogenized models.
Purpose The aim of this study is to make a contribution towards reducing the deflections of silicon wafers. The deformation of silicon wafers used in the manufacture of electronic micro-components is one of the most common problems encountered by industrialists during manufacturing. Stack warping is typically produced during the process of depositing thin layers on a substrate. This is due to the thermal-mechanical stresses caused by the difference between the thermal expansion coefficients of the materials. Reducing wafer deformation is essential to increase reliability and improve quality. In this paper, the authors propose an approach based on minimal geometrical modifications to reduce the deformation of a silicon wafer coated with two thin layers. Numerical finite element models have been developed to evaluate the impact of geometrical modifications on warping amplitude. Finite element models have been validated compared with experimental models. The results obtained are encouraging and clearly show a considerable reduction in wafer deformation. Design/methodology/approach Reducing wafer deformation is essential to increase reliability and improve quality. In this paper, the authors propose an approach based on minimal geometrical modifications to reduce the deformation of a silicon wafer coated with two thin layers. Numerical finite element models have been developed to evaluate the impact of geometrical modifications on warping amplitude. Finite element models have been validated compared with experimental models. Findings The results obtained are encouraging and clearly show a considerable reduction in wafer deformation. Originality/value This paper describes the influence of geometric modification on wafer deformation. The work show also the cruciality of stress reduction in the purpose to obtain less wafer deformation.
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