In general, magnesium metal is not used as uncoated material on account of its corrosion
characteristic. This work was done by preparing 99.99% pure magnesium coating films by RF
magnetron sputtering onto SPCC substrates [1]. The individual preparation conditions of gas
pressures and bias voltages were 1×10-2 ~ 1×10-3 Torr and 0V ~ -300V, respectively. The analysis
about crystal orientation, morphology and electrochemical characteristic of Mg thin films was
performed by using X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM),
electrochemical impedance spectroscopy (EIS) etc.. It is as a results of experiment that the
morphology of the sputtered films changed from a columnar structure to a granular structure when
Ar gas pressure increased or bias voltage decreased. Also, the prepared Mg thin film’s morphology
did not have defects and pinholes, and the corrosion resistance was improved by the formation of a
homogeneous passive layer.
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