We present a comparative study of silicon high-voltage diodes exhibiting the effect of delayed superfast impact-ionization breakdown. The effect manifests itself in a sustainable picosecond-range transient from the blocking to the conducting state and occurs when a steep voltage ramp is applied to the p+-n-n+ diode in the reverse direction. Nine groups of diodes with graded and abrupt pn-junctions have been specially fabricated for this study by different techniques from different Si substrates. Additionally, in two groups of these structures, the lifetime of nonequilibrium carriers was intentionally reduced by electron irradiation. All diodes have identical geometrical parameters and similar stationary breakdown voltages. Our experimental setup allows measuring both device voltage and current during the kilovolt switching with time resolution better than 50 ps. Although all devices are capable of forming a front with kilovolt amplitude and 100 ps risetime in the in-series load, the structures with graded pn-junctions have anomalously large residual voltage. The Deep Level Transient Spectroscopy study of all diode structures has been performed in order to evaluate the effect of deep centers on device performance. It was found that the presence of deep-level electron traps negatively correlates with parameters of superfast switching, whereas a large concentration of recombination centers created by electron irradiation has virtually no influence on switching characteristics.

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We present a comparative study of Si and GaAs high-voltage diodes operated in the delayed impact ionization breakdown mode. We use an experimental setup that allows measuring current and voltage on the diode simultaneously and independently during a 100-ps high-voltage switching transient. Si and GaAs structures with identical geometries and a stationary breakdown voltage of ∼1 kV were investigated. All devices trigger at close to 2 kV and are capable of forming a voltage ramp with a kilovolt amplitude and a 100-ps rise time. We found that Si p + nn + and p + pnn + structures differ in residual voltage: a relatively low residual voltage V res of 100-200 V was observed only for p + nn + structures, whereas for p + pnn + structures V res is about 1 kV. We report observing the lock-on effect in GaAs structures: after 100-ps avalanche switching GaAs diodes remain in a high conducting state as long as the applied voltage pulse lasts, whereas within the same time of 2 ns reference Si diodes fully recover the blocking capability.

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