Within the limitations of this pilot study, the observations herein suggest that reduction in contact area between the drill and bone reduces heat induction. Further studies to optimize drill/bone contact dimensions are needed.
Articles you may be interested inEffect of RuCoCr-oxide intermediate layers on the growth, microstructure, and recording performance of CoCrPt -SiO 2 perpendicular recording media Two-step-deposited Ru layers of 20 nm have been employed as an underlayer for CoCrPt-SiO 2 perpendicular magnetic recording media. The bottom Ru layer of 10 nm is deposited at 3 mTorr for good texture of hcp ͑0002͒ and the top Ru layer of 10 nm is deposited at various conditions. Sputtering power and Ar pressure are variables for the top Ru layer deposition. As the sputtering pressure of the top Ru layer increases, coercivity ͑H c ͒ of the CoCrPt-SiO 2 layer increases and then saturates or slightly decreases with a further increase of sputter pressure. The H c increase is mainly due to exchange decoupling among grains of CoCrPt. The c-axis alignment of the Ru layer by the two-step deposition method is much improved compared to that of a single-step-deposited Ru layer when the sputtering pressure is higher than 3 mTorr. The grain size of Ru layer is smaller and the grains are well separated by void boundaries when the top Ru sputtering pressure is high. There is a one-to-one relationship between small Ru grains and CoCrPt grains. Although the grain size of CoCrPt layer is small with a good c-axis alignment in the case of lower-pressure-deposited top Ru underlayer, H c is small. The reason will be discussed in terms of grain interconnection.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.