Establishing multi-colour patterning technology for colloidal quantum dots is critical for realising high-resolution displays based on the material. Here, we report a solution-based processing method to form patterns of quantum dots using a light-driven ligand crosslinker, ethane-1,2-diyl bis(4-azido-2,3,5,6-tetrafluorobenzoate). The crosslinker with two azide end groups can interlock the ligands of neighbouring quantum dots upon exposure to UV, yielding chemically robust quantum dot films. Exploiting the light-driven crosslinking process, different colour CdSe-based core-shell quantum dots can be photo-patterned; quantum dot patterns of red, green and blue primary colours with a sub-pixel size of 4 μm × 16 μm, corresponding to a resolution of >1400 pixels per inch, are demonstrated. The process is non-destructive, such that photoluminescence and electroluminescence characteristics of quantum dot films are preserved after crosslinking. We demonstrate that red crosslinked quantum dot light-emitting diodes exhibiting an external quantum efficiency as high as 14.6% can be obtained.
Colloidal quantum dots (QDs) stand at the forefront of a variety of photonic applications given their narrow spectral bandwidth and near-unity luminescence e ciency. Integrating desired forms of QD lms into photonic systems without compromising their optical or transport characteristics is the key to bridging the gap between expectations and outcomes. Here, we devise a dual-ligand passivation system comprising photocrosslinkable ligands and dispersing ligands to enable QDs to be universally compatible with solution-based patterning techniques. The successful control on the structure of both ligands allows multiscale, direct patterning of the dual-ligand QDs on various substrates via commercialized photolithography (i-line) or inkjet printing systems without compromising the optical properties of QDs or the optoelectronic performances of the devices implementing them. Our approach offers a versatile way of creating various structures of luminescent QDs in a cost-effective and non-destructive manner, and thus enables the implementation of QDs in a range of photonic applications. MainColloidal quantum dots (QDs) are promising materials for use in next-generation light sources due to their wide-ranging bandgap tunability, narrow spectral bandwidths, and near-unity luminescence quantum yields (QY) [1][2][3][4][5] . Together with the capability of cost-effective solution processing, QDs have become the key light-emissive materials for information displays 3,5−7 . The patterned QD down-conversion layer on blue light-emitting diodes (LEDs) renders high-color reproduction and ultra-high image quality in full-color displays 8,9 . Likewise, a laterally patterned array consisting of red, green, and blue (RGB) QD-LEDs, in which QDs convert electrically pumped charge carriers into photons, allows for excellent color gamut and brightness as well as light-weight, thin, and exible form factors [10][11][12][13] , which are suited for wearable neareye displays for virtual reality (VR) and augmented reality (AR) devices. For these "mixed-reality" applications, the QD deposition process should enable the patterning of RGB QDs (or RG QDs along with the bank) into a few micrometer sub-pixels over a large area with high-precision and high-delity 14,15 . At the same time, the process should not disrupt the optical and transport characteristics of QDs and adjacent functional layers. Moreover, from a practical standpoint, it poses great bene t if one can use equipment that are already deployed in display device manufacturing steps for the patterning process.
Colloidal quantum dots (QDs) stand at the forefront of a variety of photonic applications given their narrow spectral bandwidth and near-unity luminescence efficiency. Integrating desired forms of QD films into photonic systems without compromising their optical or transport characteristics is the key to bridging the gap between expectations and outcomes. Here, we devise a dual-ligand passivation system comprising photocrosslinkable ligands and dispersing ligands to enable QDs to be universally compatible with solution-based patterning techniques. The successful control on the structure of both ligands allows multiscale, direct patterning of the dual-ligand QDs on various substrates via commercialized photolithography (i-line) or inkjet printing systems without compromising the optical properties of QDs or the optoelectronic performances of the devices implementing them. Our approach offers a versatile way of creating various structures of luminescent QDs in a cost-effective and non-destructive manner, and thus enables the implementation of QDs in a range of photonic applications.
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