Alumina Josephson junction has demonstrated a tremendous potential to realize superconducting qubits. Further progress towards scalable superconducting qubits urgently needs to be guided by novel analysis mechanisms or methods to reduce the thickness sensitivity of the junction critical current to the tunnel barrier. Here, it is first revealed that the termination mode of AlOx interface plays a crucial role in the uniformity of critical current, and we demonstrate that the O-terminated interface has the lowest resistance sensitivity to thickness. More impressively, we developed atomically structured three-dimensional models and calculated their transport properties using a combination of quantum ballistic transport theory with first-principles DFT and NEGF to examine the effects of the Al2O3 termination mode and thickness variations. This work clarifies that O-terminated interface can effectively improve the resistance uniformity of Josephson junction, offering useful guidance for increasing the yield of fixed-frequency multi-qubit quantum chips which require tight control on qubit frequency.
All-nitride Josephson junctions are being actively explored for applications in superconducting quantum chips because of their unique advantages including their antioxidant chemical stability and high crystal quality. However, the theoretical research on their microstructure mechanism that determines transport properties is still absent, especially on the defects. In this paper, we apply the first principles and non-equilibrium Green’s function to calculate the electrical transport characteristics of the yellow preset model. It is first revealed that the N-vacancy defects play a crucial role in determining the conductivity of the NbN-based Josephson junctions, and demonstrate the importance for the uniformity of vacancy distribution. It is found that the uniform number of vacancies can effectively increase the conductance of Josephson junction, but the position distribution of vacancies has little effect on the conductance. The work clarifies the effect of the N-vacancy defects on the conductivity of the NbN-based Josephson junctions, which offers useful guidance for understanding the microscope mechanism of the NbN-based Josephson junction, thus showing a great prospect in the improvement of the yield of superconducting quantum chips in the future.
Despite many improvements in the quality and reliability
of Josephson
junctions, the understanding of their noise sources, particularly
the effect of oxidation parameters on the atomic arrangement of the
interface and barrier layers, remains elusive. Here, we apply a Voronoi
tessellation, a geometrically structural and topological analysis,
to the amorphous barriers in aluminum oxide junctions. To enable this
analysis, we perform million-atom molecular dynamics simulations to
develop oxidation models at different temperatures. We find that the
temperature introduces noise by changing the atomic compactness of
oxides in the junctions. High-temperature oxidation aggravates the
structural disorder and surface roughness of the barrier. This work
will pave the way for illustrating the microscopic noise origin of
amorphous oxides, which can transform our fundamental understanding
of noncrystalline materials and qubit decoherence mechanisms.
Although the performance of qubits has been improved in recent years, the differences in the microscopic atomic structure of the Josephson junctions, the core devices prepared under different preparation conditions, are still underexplored. In this paper, the effects of the oxygen temperature and upper aluminum deposition rate on the topology of the barrier layer in the aluminum-based Josephson junctions have been presented by classical molecular dynamics simulations. We apply a Voronoi tessellation method to characterize the topology of the interface and central regions of the barrier layers. We find that when the oxygen temperature is 573 K and the upper aluminum deposition rate is 4 Å/ps, the barrier has the fewest atomic voids and the most closely arranged atoms. However, if only the atomic arrangement of the central region is considered, the optimal rate of the aluminum deposition is 8 Å/ps. This work provides microscopic guidance for the experimental preparation of Josephson junctions, which helps to improve the performance of qubits and accelerate the practical application of quantum computers.
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