355 nm high-reflective multilayer coatings with or without coevaporated interfaces (CEIs) were prepared by electron beam evaporation under the same deposition condition. Their transmission spectra, surface roughness, and mechanical stress properties were evaluated. Elemental composition analysis of the multilayer interfaces was performed using x-ray photoelectron spectroscopy, and laser-induced damage thresholds were obtained in both 1-on-1 and 300-on-1 testing modes. The coatings with CEIs reveal a lower mechanical stress and a higher laser damage resistance when irradiated with high laser fluence, and the corresponding damage modeling indicates that CEIs can significantly decrease defect density. The resulting damage morphologies show that CEI coatings can significantly suppress coating delamination and exhibit a "bulk-like" damage behavior, demonstrating better damage performance against high-power lasers.
Nanosecond laser-resistance to dielectric multilayer coatings on substrate pits was examined with respect to the electric-field (E-field) enhancement and mechanical properties. The laser-induced damage sensitivity to the shape of the substrate pits has not been directly investigated through experiments, thus preventing clear understanding of the damage mechanism of substrate pits. We performed a systematic and comparative study to reveal the effects of the E-field distributions and localized stress concentration on the damage behaviour of coatings on substrates with pits. To obtain reliable results, substrate pits with different geometries were fabricated using a 520-nm femtosecond laser-processing platform. By using the finite element method, the E-field distribution and localized stress of the pitted region were well simulated. The 1064-nm damage morphologies of the coated pit were directly compared with simulated E-field intensity profiles and stress distributions. To enable further understanding, a simplified geometrical model was established, and the damage mechanism was introduced.
In the pursuit of 1064 nm high-power laser resistance dielectric coatings in the nanosecond region, a group of HfO2/SiO2 high reflectors with and without suture layers were prepared on prearranged fused silica substrates with femtosecond laser pits. Surface morphology, global coating stress, and high-resolution cross sections were characterized to determine the effects of substrate pit suturing. Laser-induced damage resistance was investigated for samples with and without suture layers. Our results indicate considerable stability in terms of the nanosecond 1064 nm laser-induced damage threshold for samples having a suture layer, due to decreased electronic field (e-field) deformation with simultaneous elimination of internal cracks. In addition, a suture layer formed by plasma ion-assisted deposition could effectively improve global mechanical stress of the coatings. By effectively reducing the multilayer deformation using a suture layer, electron-beam high-reflective coatings, whose laser-induced damage resistance was not influenced by the substrate pit, can be prepared.
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