Transparent conducting electrodes (TCEs) formed with silver nanowires (AgNWs) have attracted attention as substitutes for indium tin oxide (ITO). However, the randomly deposited AgNW film performs poorly in terms of the transmittance and sheet resistance to serve as a substitute of ITO. To improve the performance of the AgNW film, we fabricated a grid-patterned AgNW by modifying the surface energy of the substrate. The hydrophobized surface was selectively etched by UV light through a quartz chrome mask, and a suspension of AgNWs in isopropyl alcohol/ethylene glycol mixture was coated on the substrate by a meniscus dragging deposition process. The grid-patterned AgNW film has a lower percolation threshold and a 13% higher figure-of-merit value compared to the randomly deposited AgNW film. The transparent thin films with a grid structure of AgNWs exhibit the high electrical conductivity with a sheet resistance of 33 Ohm/sq at a transmittance of 92.7% (λ = 550 nm).
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