We report on a measurement of craters in thin dielectric films formed by Xe(Q+) (26 ≤ Q ≤ 44) projectiles. Tunnel junction devices with ion-irradiated barriers were used to amplify the effect of charge-dependent cratering through the exponential dependence of tunneling conductance on barrier thickness. Electrical conductance of a crater σ(c)(Q) increased by 4 orders of magnitude (7.9 × 10(-4) μS to 6.1 μS) as Q increased, corresponding to crater depths ranging from 2 to 11 Å. By employing a heated spike model, we determine that the energy required to produce the craters spans from 8 to 25 keV over the investigated charge states. Considering energy from preequilibrium nuclear and electronic stopping as well as neutralization, we find that at least (27 ± 2)% of available projectile neutralization energy is deposited into the thin film during impact.

Scanning tunneling microscopy (STM) has been used to image charged defects on the clean Si(100)-(2×1) surface. Previous studies have shown that, in the absence of “C”-type defects, the surface does not pin the Fermi level, allowing near surface charge to influence the state density contributing to the tunneling current. As in the case of cleavage faces of III–V semiconductor crystals, the charge-induced band bending produces long-range enhancements superimposed on the periodic surface lattice. This is observed in empty-state STM images taken on n-type material. No band bending signature is seen in the filled-state images. This can be understood by considering the band structure at the surface, which has surface states within the band gap. The charged defects observed in this work are of the types commonly observed in clean Si(100)-(2×1) STM studies, however, not all defects of a given type appear charged. This would indicate subtle differences in structure or the influence of impurities. Predictions for p-type material will also be made.

No abstract

We have used scanning tunneling microscopy to identify individual phosphorus dopant atoms near the clean silicon (100)-(2×1) reconstructed surface. The charge-induced band bending signature associated with the dopants shows up as an enhancement in both filled and empty states and is consistent with the appearance of n-type dopants on compound semiconductor surfaces and passivated Si(100)-(2×1). We observe dopants at different depths and see a strong dependence of the signature on the magnitude of the sample voltage. Our results suggest that, on this clean surface, the antibonding surface state band acts as an extension of the bulk conduction band into the gap. The positively charged dimer vacancies that have been observed previously appear as depressions in the filled states, as opposed to enhancements, because they disrupt these surface bands.