The time-dependent dielectric breakdown of Co/Al2O3/Co(-Fe) magnetic tunnel junctions is investigated. At voltages larger than 1.2 V, almost immediate breakdown of the junction is observed, leading to a decreased (magneto)resistance. The shorts, which are local hot spots, were visualized by making use of a liquid crystal film on top of the junction. The breakdown voltages of a series of nominally identical tunnel junctions measured in a voltage-ramp experiment are shown to increase with increasing ramp speed. The results are analyzed in the framework of several models for the voltage dependent breakdown probability.

Due to their very thin tunnel barrier layer, magnetic tunnel junctions show dielectric breakdown at voltages of the order of 1 V. At the moment of breakdown, a highly conductive short is formed in the barrier and is visible as a hot spot. The breakdown effect is investigated by means of voltage ramp experiments on a series of nominally identical Co/Al 2 O 3 /Co tunnel junctions. The results are described in terms of a voltage dependent breakdown probability, and are further analyzed within the framework of a general model for the breakdown probability in dielectric materials, within which it is assumed that at any time the breakdown probability is independent of the ͑possibly time-dependent͒ voltage that has been previously applied. The experimental data can be described by several specific forms of the voltage breakdown probability function. A comparison with the models commonly used for describing thin film SiO 2 breakdown is given, as well as suggestions for future experiments.

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