Zerodur and BK7 glass substrates (developed by Fa. Glaswerke Schott, D-55014 Mainz, Germany) from Carl Zeiss Oberkochen polished to a standard surface roughness of varsigma = 0.8 nm rms were coated with a C layer by electron-beam evaporation in the UHV. The roughness of the C-layer surfaces is reduced to 0.6 nm rms. A normal-incidence reflectance of 50% at a wavelength of 13 nm was measured for a Mo/Si multilayer soft-x-ray mirror with 30 double layers (N = 30) deposited onto the BK7/C substrate, whereas a similar Mo/Si multilayer (N = 30) evaporated directly onto the bare BK7 surface turned out to show a reflectance of only 42%.
Design of a beamline for soft and deep lithography on third generation synchrotron radiation source Rev.A W/Si multilayer was used to determine the degree of circular polarization of the soft x-ray radiation of the European Synchrotron Radiation Facility helical undulator HELIOS I. The multilayer, manufactured by vapor deposition serves as a wideband tunable polarization analyzer in the photon energy range from 520 to 930 eV. The characterization of the multilayer's analyzing power, varying from 0.82 to 0.25 for these energies, indicates that it operates close to its calculated specifications. The lack of phase-shifters applicable in this energy range was overcome by a detailed analysis of the unpolarized background identified as radiation from the magnetic lattice. In this way, the degree of circular polarization of HELIOS I was determined to exceed 0.85 for hϾ685 eV.
Two Mo/Si multilayer-coated blazed gratings have been fabricated for operation at soft-x-ray wavelengths above the Si L edge, λ ≥ 12.4 nm, at (near) normal incidence. The sawtooth profile of the grating structure was mechanically ruled into a 200-nm Au film that was deposited onto a plane glass substrate. To smooth the rough Au surface and to prevent interdiffusion of the Au film with the upper Mo/Si multilayer, a carbon film was evaporated onto the Au grating surface of one of the gratings before the deposition of the multilayer coating. We matched the multilayer grating, working on blaze in the third diffraction order, in which an absolute diffraction efficiency of 3.4% at a wavelength of 14 nm was measured, whereas only 1.1% was achieved for a similar grating (without a carbon interlayer). These efficiencies are higher than those obtained for other ruled blazed gratings reported in the literature. As a result of the multilayer and grating periodicity, the wavelength of diffraction can be tuned bya rotation of the grating, which is important for application in a soft-x-ray monochromator.
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