The effect of hydrogen reduction on the characteristics of Cu films deposited using a 13.56 MHz RF Ar/H 2 atmospheric pressure plasma jet with a Cu thin wire set inside a quartz tube was studied. By adding a small amount of H 2 gas into Ar carrier gas, it was found that intense emissions of N 2 molecule second positive systems, OH and O emissions were significantly suppressed, while Cu and H lines were intensified. It was confirmed by an X-ray photoelectron spectrometry that a high purity Cu film was synthesized via hydrogen reduction reaction, preventing the oxidization of Cu film. #
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