In recent years, the reduction in pattern size is driving the rapid adoption of nanoimprint lithography (NIL). Since nanoimprinting since is contact printing, a higher separation force might damage the master and/or the imprint tool, either of which degrades pattern quality. One of the biggest concerns in NIL utilization is the mold-release characteristic of the master and the resin. Although Optool DSX TM (DAIKIN Ind. Ltd.) is a de facto standard as mold release reagent, there is a problem with its UV-NIL durability. Accordingly, we focused on developing new fluorinated low molecular weight perfluorocompounds to enhance the mold-release characteristic of the resist. This paper reports that resists containing these fluroinated compounds offer improved durability as antistick layers for quartz molds subjected to repeated UV-NIL exposure.
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