A n epoxy-terminated disulfide oligomer (a,w-(2,3-epoxypropane)hexa[ l,l'-methylenedioxybis(2-thioetbane)]; EDS) in 1,1,l-trichloroethane was adsorbed with a density 2.8 times greater than that expected for EDS lying flat on a-FeOOH at 303.2 K. The EDS adsorption was interpreted by a loop-train-tail model. XPS and DRIFT spectra showed that about 15% of the sulfur atom in the monolayer was chemisorbed to form a monosulfoxide and the rest of the sulfur atoms in the train parts may interact weakly with the surfaces. The irradiation by W light promoted the EDS adsorption. This seems to relate to the formation of some oxidized sulfur species, such as a disulfoxide and a thiosulfone, which may be formed by oxidation due to holes produced by photoexcitation of an n-type semiconductor. The adsorption state and photoadsorption mechanism of EDS molecules at possible sites on a-FeOOH surfaces are discussed.
The powder PMR spectra of [TMPD]+(ClO4)− were recorded in the temperature range 110–300 K. The spectra observed above 140 K consist of two widely separated simple absorption curves of intensity ratio approximately equal to 3 : 1. Spin densities on the carbon and nitrogen atoms of the cation radical were evaluated from the observed field shift ascribable to the Fermi contact interaction. The spin density distribution of the radical ion changes at the transition temperature of 189 K.
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