Dependence on cation size of thermally induced capacitive effect of a nanoporous carbon Thermally induced capacitive effect of a nanoporous monel Appl. Phys. Lett. 91, 153102 (2007);
After an exhaustive reevaluation of the contact printing processes, photoresist sticking to the photomask surface is identified as the principal cause of patterning defects and a preventive measure is developed. This process, called surface conversion for antisticking (SURCAS), facilitates a reduction in defect density by about one‐fourth compared to conventional contact printing. This technique opens the way for improvement of current LSI fabrication, and moreover should be useful in ultrafine pattern lithography down to 1 μm in the near future.
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