X-ray imaging is used in many applications such as medical diagnosis and non-destructive inspection, and has become an essential technologies in these areas. In one image technique, X-ray phase information is obtained using X-ray Talbot interferometer, for which X-ray diffraction gratings are required; however, the manufacture of fine, highly accurate, and high aspect ratio gratings is very difficult. X-ray lithography could be used to fabricate structures with high precision since it uses highly directive syncrotron radiation. Therefore, we decided to fabricate X-ray gratings using X-ray lithography technique. The accuracy of the fabricated structure depends largely on the accuracy of the X-ray mask used. In our research, we combined deep silicon dry etching technology with ultraviolet lithography in order to fabricate untapered and high precision X-ray masks containing rectangular patterns. We succeeded in fabricating an X-ray mask with a pitch of 5.3 lm. The thickness of the Au absorber was about 5 lm, and the effective area was 60 9 60 mm 2 , which is a sufficient size for phase tomography imaging. We demonstrated the utility of the Si dry etching process for making high precision X-ray masks.
X-ray radiographic imaging technique has found applications in various fields. However, it is not enough to get clear X-ray images of samples with low absorbance, such as biological soft tissues. To resolve this problem, we proposed a method using an X-ray Talbot interferometer of X-ray phase imaging. In this X-ray Talbot interferometer, X-ray gratings were required to have a fine, high accuracy, high aspect ratio structure. Then, we have developed and succeeded high aspect ratio X-ray gratings with a pitch of 5.3 µm and a height of 30 µm using X-ray lithography technique. We discuss that the X-ray gratings having a large effective area in order to obtain imaging size of practical use in medical application. In currently study, we have fabricated the X-ray gratings with a large effective area of 60 mm × 60 mm. And, we conducted X-ray phase tomography of mouse at the chest and abdominal using X-ray Talbot interferometer. As a result, we successfully observed soft tissues and high density tissues. With the aim of broadening a field of view, we try to fabricate X-ray gratings that have a pitch of below 5.3 µm and larger area of 100 mm square. This result suggests that X-ray Talbot interferometer is a novel and simple method for phase sensitive X-ray radiography.
The X-ray radiographic imaging technique is very important in medical, biological, inspection, material science, and other fields. However, it is not enough to obtain a clear X-ray image of samples with low absorbance materials, such as biological soft tissues. Then, we have used an X-ray phase-imaging method of an X-ray Talbot interferometer. In this method, X-ray gratings were required to have a narrow pitch and high aspect ratio structure. Therefore, we have developed and fabricated high-aspect-ratio X-ray gratings with a pitch of 5.3μm , a height of 30μm , and a large effective area of 100×100mm using X-ray lithography and narrow electroforming techniques. In this paper, we discuss the fabrication process of X-ray gratings with a narrow pitch and high-aspect-ratio structure, and results of X-ray phase tomography using an X-ray Talbot interferometer with these X-ray gratings.
The X-ray lithography of uses synchrotron radiation is one of the microprocessing structure fabrication technology. In X-ray lithography, precision of the fabricated structure is influenced by precision of the X-ray mask considerably. Conventionally, the X-ray mask was fabricated with UV lithography. However, it is difficult to fabricate the highly precise X-ray mask because of the tapering X-ray absorber. We introduces the ability of Si dry etching technology into UV lithography in order to fabricate untapered, high precision X-ray masks containing rectangular patterns. This new X-ray mask fabrication method uses a high-precision microstructure pattern formed by Si dry etching, thereby fabricating high aspect ratio, narrow line width resist microstructures that cannot be achieved by any conventional technology. An Au for the X-ray absorber is made to the groove of the structure, and it is formed by electroplating. The silicon substrate itself is used as seed layer and the structure is fabricated with the photo resist whose resistance is higher than silicon. It can be expected the gilding growth from only the bottom layer. High-density Au functions sufficiently as an absorber. Au plating was formed only from the base of the structure ditch and could bury Au of thickness 3.5µm in a narrow place of 2.7µm in width well. The fabricated structure using X-ray lithography. Highly-precise rectangular structure could be fabricated.
X-ray radiographic imaging technique is very important in medical, biological, inspection, material science, and so on. However, it is not enough to obtain clear X-ray images of samples with low absorbance materials, such as biological soft tissues. Then, we have used an X-ray phase imaging method of an X-ray Talbot interferometer. In this method, X-ray gratings were required to have narrow pitch and high aspect ratio structure. Therefore, we have developed and fabricated high aspect ratio X-ray gratings with a pitch of 5.3 m, a height of 30 m, and a large effective area of 100 mm × 100 mm using X-ray lithography and narrow electroforming technique. In this paper, we discuss the fabrication process of X-ray gratings and results of X-ray phase tomography using an X-ray Talbot interferometer with these X-ray gratings.
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