The atom transfer radical polymerization (ATRP) of styrene and acrylates from silicon wafers modified with an initiator layer composed of 2-bromoisobutyrate fragments is described. In the presence of the proper ratio of activating and deactivating transition-metal species, controlled radical polymerizations of styrene were observed such that the thickness of the layer consisting of chains grown from the surface increased linearly with the molecular weight of chains polymerized in solution in identical, yet separate, experiments. The layer thickness increased linearly with reaction time for ATRP of styrene and methyl acrylate due to both the extremely low initiator concentration relative to monomer and the low monomer conversion. Further evidence for control was observed by the polymerization of blocks of either methyl or tert-butyl acrylate from the polystyrene layer. Modification of the hydrophilicity of the surface layer was achieved by hydrolysis of the poly(styrene-b-tert-butyl acrylate) to poly(styrene-b-acrylic acid) and confirmed by decrease in water contact angle from 86° to 18°. The mechanistic aspects of ATRP in the polymerization process were confirmed by the growth of very thick polystyrene films in the presence of a pure copper(I) complex. Since no deactivator was present, the metal complex served only to facilitate initiation by a redox process. Attempts to extend chain with methyl acrylate under controlled conditions were unsuccessful in those films. The simulation of polymerization of surface layers suggests broader molecular weight and chain end distributions, confirming XPS results on the progressive decrease of Br absorption intensity.

Monolayers of 11-azido-undecylsiloxane were prepared on powdered silica and on silicon wafers by the substitution of 11-bromo-undecylsiloxane and were subsequently coupled with three substituted acetylenes R−C⋮C−R‘ (R, R‘ = C6H13, H (1); COOCH3, H (2); COOC2H5, COOC2H5 (3)) to yield 1,2,3 triazoles via the Huisgen 1,3-dipolar cycloaddition reaction. The pathway and yield of the surface reactions were monitored by infrared spectroscopy and ellipsometry. No reaction was observed with 1, whereas 2 and 3 react quantitatively both on powdered silica and on flat wafer surfaces at a temperature of 70 °C without catalytic activation. Thus, the unique properties of this reaction in solution (high selectivity, quantitative yields, no byproducts, simple reaction conditions) seem to be transferable to surface-bound reactants and might provide access to a range of novel, functionalized surfaces by analogy to the Sharpless click chemistry concept for solution-phase synthesis.

The formation and growth of self-assembled octadecylsiloxane monolayers on native silicon and mica substrates have been studied using atomic force microscopy, ellipsometry, and infrared spectroscopy. Submonolayer ODS films of varying surface coverages were prepared by immersing the substrates into dilute solutions of octadecyltrichlorosilane in toluene for different periods of time, and the submonolayer film structures were compared between mica and silicon substrates for different water contents of the adsorbate solutions and for different time delays between solution preparation and substrate immersion (solution age). It was found that, in general, both a continuous growth (formation of disordered, liquidlike submonolayers) and an island-type growth (formation of organized assemblies with vertically aligned hydrocarbon chains) are involved in the formation of ODS monolayers, whereby the relative contributions depend strongly on the solution properties. With increasing water content or increasing age of the adsorbate solution, island-type growth is strongly favored on both silicon and mica surfaces, which indicates the kinetically controlled formation of larger, preordered aggregates of silanol molecules as the primary hydrolysis products in solution. For identical conditions of film preparation, both the degree of structural order in the submonolayer films and the overall adsorption rate was found to be higher on mica in comparison to silicon. The higher structural order was interpreted as a consequence of the lower hydroxyl group concentration and a correspondingly enhanced surface diffusion rate of weakly bound film molecules on a mica substrate. The enhanced adsorption rate, on the other hand, points to some additional activation of a mica surface with respect to silanol adsorption, which might be related to its ionic composition containing mobile surface charges in contrast to the covalent, neutral character of a native silicon surface.

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In photopolymerization reactions, mostly multifunctional monomers are employed, as they ensure fast reaction times and good final mechanical properties of the cured materials. Drawing conclusions about the influence of the components and curing conditions on the mechanical properties of the subsequently formed insoluble networks is challenging. Therefore, an in situ observation of chemical and mechanical characteristics during the photopolymerization reaction is desired. By coupling of an infrared spectrometer with a photorheometer, a broad spectrum of different photopolymerizable formulations can be analyzed during the curing reaction. The rheological information (i.e., time to gelation, final modulus, shrinkage force) can be derived from a parallel plate rheometer equipped with a UV- and IR-translucent window (glass for NIR and CaF window for MIR). Chemical information (i.e., conversion at the gel point and final conversion) is gained by monitoring the decrease of the corresponding IR-peak for the reactive monomer unit (e.g., C═C double bond peak for (meth)acrylates, H-S thiol and C═C double bond peak in thiol-ene systems, C-O epoxy peak for epoxy resins). Depending on the relative concentration of reactive functional groups in the sample volume and the intensity of the IR signal, the conversion can be monitored in the near-infrared region (e.g., acrylate double bonds, epoxy groups) or the MIR region (e.g., thiol signal). Moreover, an integrated Peltier element and external heating hood enable the characterization of photopolymerization reactions at elevated temperatures, which also widens the window of application to resins that are waxy or solid at ambient conditions. By switching from water to heavy water, the chemical conversion during photopolymerization of hydrogel precursor formulations can also be examined. Moreover, this device could also represent an analytical tool for a variety of thermally and redox initiated systems.

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The formation of alkylsiloxane monolayers O x Si−(CH2) n −Y with different hydrocarbon chain lengths (n = 10, 16, 17) and different terminal substituents (Y = CH3, COOCH3, CN, Br) on native silicon (Si/SiO2) was studied by means of in situ internal reflection IR spectroscopy (ATR) at the interface between a Si ATR crystal and the precursor solution. The growth of the ν(CH2) stretching absorptions of the monolayer films, monitored with s-polarized and p-polarized radiation, provided information on the monolayer formation rates and on structural changes in the course of the growth process. The film molecules adsorb initially in a random, disordered configuration. With increasing coverage, the hydrocarbon chains gradually align and stand up on the surface. Their final orientation in the complete monolayer films depends both on the chain length and on the type of terminal substitution, whereby chain tilt angles between 7° for O x Si−(CH2)17−CH3 and 21° for O x Si−(CH2)16−CN and O x Si−(CH2)16−Br were found. The film growth follows essentially a Langmuir model of irreversible adsorption, from which the adsorption rate constants were derived. Whereas the chain length and the terminal substituent have relatively small influences on the adsorption rates, a higher water content of the precursor solutions strongly accelerates the film formation and, in addition, causes significant deviations from a Langmuir growth model. These findings were interpreted as a consequence of polycondensation of the precursor molecules in solution.

Monolayers of octadecylsiloxane were formed on native silicon (Si/SiO2) and glass surfaces by adsorption from dilute solutions of octadecyltrichlor osilane and were investigated by polarization- and angle-dependent external reflection infrared spectroscopy. In contrast to metal substrates, both the parallel and perpendicular vibrational components of the adsorbate can be detected on these dielectric surfaces. The monolayer reflection spectra show significant changes as a function of the light incidence angle and the polarization of the infrared radiation, which contain detailed information on the surface orientation of the film molecules. Spectral simulations based on classical electromagnetic theory yield an average 10° tilt angle of the hydrocarbon chains with respect to the surface normal on both silicon and glass surfaces. Despite this apparent structural identity of the monolayer films on silicon and glass, significant differences are observed in the monolayer reflection spectra resulting from purely optical effects of the substrate.