A hydrophilic amorphous carbon film was deposited with plasma-enhanced chemical vapor deposition using diisopropylether ((i-C 3 H 7 ) 2 O) as a source molecule. Bonding states of hydrocarbon in the deposited film are comprised of sp 3 -hydrocarbon components, which is the same as the isopropyl group in the source molecule. On the other hand, C=O bonding is formed in the deposited film, not as similar to the source molecule, diisopropylether. These results suggest that C-O-C in the source molecule would be cleaved. This study would propose a new deposition method of a hydrophilic amorphous carbon film with ether as a source molecule.
K E Y W O R D Samorphous carbon, bonding states, carboxyl, ether, hydrophilicity Electron Comm Jpn. 2019;102:3-9.
Changes in chemical states of amorphous carbon film during ethylene (C 2 H 4 ) plasma in the floating potential were investigated with multiple-internal-reflection infrared absorption spectroscopy (MIR-IRAS) and deposition rates. IRAS spectra showed that the peaks due to the sp 3 -CH X were observed, but no peaks due to sp 2 -CH X were observed. The deposition rate due to ethylene plasma was nearly twice that due to methane plasma, in the same way that the number of carbons in an ethylene molecule is twice as that in a methane molecule. It is suggested that the film growth due to ethylene plasma is the same manner of that due to methane plasma; the plasma-generated hydrocarbon species such as C 2 H 3 and C 2 H 5 , which are generated in ethylene plasma, are adsorbed on dangling bonds that are generated by hydrogen abstraction from the deposited film surface. As a result, the deposited film is composed of sp 3 -hydrocarbon components.
K E Y W O R D Sdeposition process, during plasma, infrared absorption spectroscopy, multiple internal reflection 10
A hydrophilic amorphous carbon film was deposited with plasma-enhanced chemical vapor deposition using diisopropylether ((i-C 3 H 7 ) 2 O) as a source molecule. Bonding states of hydrocarbon in the deposited film are comprised of sp 3 -hydrocarbon components, which is the same as the isopropyl group in the source molecule. On the other hand, C=O bonding is formed in the deposited film, not as similar to the source molecule, diisopropylether. These results suggest that C-O-C in the source molecule would be cleaved. This study would propose a new deposition method of a hydrophilic amorphous carbon film with ether as a source molecule.
K E Y W O R D Samorphous carbon, bonding states, carboxyl, ether, hydrophilicity Electron Comm Jpn. 2019;102:3-9.
Changes in chemical states of amorphous carbon film during ethylene (C 2 H 4 ) plasma in the floating potential were investigated with multiple-internal-reflection infrared absorption spectroscopy (MIR-IRAS) and deposition rates. IRAS spectra showed that the peaks due to the sp 3 -CH X were observed, but no peaks due to sp 2 -CH X were observed. The deposition rate due to ethylene plasma was nearly twice that due to methane plasma, in the same way that the number of carbons in an ethylene molecule is twice as that in a methane molecule. It is suggested that the film growth due to ethylene plasma is the same manner of that due to methane plasma; the plasma-generated hydrocarbon species such as C 2 H 3 and C 2 H 5 , which are generated in ethylene plasma, are adsorbed on dangling bonds that are generated by hydrogen abstraction from the deposited film surface. As a result, the deposited film is composed of sp 3 -hydrocarbon components.
K E Y W O R D Sdeposition process, during plasma, infrared absorption spectroscopy, multiple internal reflection 10
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